The Fabrication and Optimization of Nanostructures Using Glancing Angle Deposition

MA Lingwei,ZHOU Qin,ZHANG Zhengjun
DOI: https://doi.org/10.11951/j.issn.1005-0299.20160301
2016-01-01
Abstract:Due to the special structures, nanomaterials possess many unique physical and chemical properties compared with their bulk states. The key points of developing nanomaterials are the fabrication, morphological modulation and property optimization of nanostructures. Glancing angle deposition ( GLAD) is an effective way to fabricate nanostructures with specific morphologies by preparing nano?films at large deposition angles (>75 °) and controllably adjusting the deposition parameters. The GLAD technique could conveniently fabricate nanostructures with high purity and aligned arrangement in a large scale, which is an ideal method to prepare nanomaterials for various applications.By introducing the successful preparation of hafnia antireflection films and silver?basedsurface?enhanced Raman scattering ( SERS) substrates fabricated via GLAD method, the relationship between the deposition parameters and the specific morphologies as well as properties of nanostructureswere investigated in detail. Meanwhile, efforts have been directed to combine GLAD with other advanced methods (e.g., atomic layer deposition) so as to further improve the properties of nanostructures and broad the employment of GLAD.It is believed that the GLAD technique is an efficient and viable way in the fabrication of nanostructures, which has wide potential applications.
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