Colloidal quantum dot-silicon photodetector based on TCAD simulation

Yuanlin Shi,Zhiming Wu,Jun Gou,Xiang Dong,Jun Wang,Yadong Jiang
DOI: https://doi.org/10.1117/12.2576295
2020-01-01
Abstract:Lead sulfide colloidal quantum dots, similar to the nanoscale crystals of most semiconductor crystals, are available in a variety of sizes, shapes, and compositions as well as to make different chemical molecular ligands to modify the surface of the quantum dots and to fabricate functional optoelectronic devices on a variety of substrate materials. The combination of silicon and colloidal quantum dots enables the fabrication of silicon-based compatible quantum dot optoelectronic devices over a wide range of applications. In this paper, the effects of channel doping concentration and channel length on the performance of silicon-based CQD/Si photodetectors are calculated and analyzed from the simulation method. The results show that a suitable doping concentration and a short channel length can improve the performance of the device, which provides a simulation basis for the fabrication of silicon-based compatible arrayed colloidal quantum dot photodetectors.
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