Near-infrared silicon quantum dots metal-oxide-semiconductor field-effect transistor photodetector

Jia-Min Shieh,Wen-Chien Yu,Jung Y. Huang,Chao-Kei Wang,Bau-Tong Dai,Huang-Yan Jhan,Chih-Wei Hsu,Hao-Chung Kuo,Fu-Liang Yang,Ci-Ling Pan
DOI: https://doi.org/10.1063/1.3156806
IF: 4
2009-06-15
Applied Physics Letters
Abstract:A fully silicon-based metal-oxide-semiconductor field-effect transistor is demonstrated for the detection of near-infrared light. Si nanocrystals (nc-Si) are synthesized in the nanopore channels of mesoporous silica (MS) inserted between two oxide layers to form a complete gate structure of polycrystalline Si/SiO2/nc-Si-in-MS/SiO2 with a polycrystalline Si electrode. Illuminating the gate with near-infrared light, a photoresponsivity as high as 2.8 A/W at 1.55 μm can be achieved. The improved photoresponsivity is attributed to from optical transitions via interface states and a current amplification mechanism of the device.
physics, applied
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