Recent Advances In Rapid Polishing Process Of Large Aperture Optical Flats

Ruiqing Xie,Shijie Zhao,Defeng Liao,Xianhua Chen,Jian Wang,Qiao Xu,Huiying Zhao,Zhuangde Jiang

DOI: https://doi.org/10.1117/12.2505131

2018-01-01

Abstract:A full aperture rapid polishing process (RPP) have been developed for batch producing high-precision large aperture optical flats required in some extreme application, such as high power laser, extreme ultraviolet lithography. Combining the theory of ultra-precision machine and chemical mechanical polishing, RPP can polish out the large aperture flat optical components in several hours or less. The material removal rate of fused silica component can be enhanced to >= 12 lam/h in RPP, which polishing efficiency is more than ten times of traditional pitch polishing process. The surface roughness also can be down to 0.3nm (RMS). Through several process improvements, the surface figure is determinately controlled, and subsurface damage can be quickly removed and suppressed. At last, high accuracy optical components can be obtained with high flatness (sub-micron), super smooth (sub-nanometer), and near-zero defects (SSD density <= 0.02 def/cm(2)).