Statistical Feature Extraction and Hybrid Feature Selection for Material Removal Rate Prediction in Chemical Mechanical Planarization Process

Wenlan Jiang,Chunpu Lv,Bing Yang,Fuquan Zhang,Ying Gao,Tao Zhang,Huangang Wang
DOI: https://doi.org/10.1109/EDTM50988.2021.9421002
2021-01-01
Abstract:The prediction for average Material Removal Rate (MRR) in Chemical Mechanical Planarization (CMP) process has been recognized to be critical for working condition identification in semiconductor manufacturing. This paper focuses on feature engineering in virtual metrology (VM) for MRR prediction. A statistical feature extraction method is proposed, and a two-step hybrid feature selection method is designed to select the relevant feature subset Enhanced performance is achieved on the PHM16 data set.
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