Oxidation Resistance and Diffusion Behavior of MoSi2/WSi2/(Nb,X)Si2 Compound Coating at 1400 °C

Gao Yue,Xiping Guo,Yanqiang Qiao
DOI: https://doi.org/10.1016/j.jallcom.2021.159498
IF: 6.2
2021-01-01
Journal of Alloys and Compounds
Abstract:MoSi2/WSi2/(Nb,X)Si-2 compound coating showed outstanding oxidation resistance at 1400 degrees C. After oxidation for 100 h, the specimen kept good integrality and the parabolic rate constant of the scale growth was about 1.497 mu m(2) h(-1). NbSi2 layer could improve the bonding of MoSi2/WSi2 layers to the substrate, postpone their degradation into porous sub-silicide layer and provide adequate Si for oxidation. The intense interdiffusion between MoSi2 and WSi2 layers would result in formation of pores in WSi2 layer and then weaken its barrier effect. In addition, a small amount of alloying elements Ti, Cr and Al from the substrate could diffuse through the MoSi2/WSi2 layers along the grain boundaries during oxidation. As a result, there are TiO2 formed in the scale. After oxidation for 100 h, a gradient compound layer of (Mo,W)Si-2/(W,X)Si-2/(Ti,Nb)(5)Si-4 formed eventually. (c) 2021 Elsevier B.V. All rights reserved.
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