Study on elastic modulus of ultra-thin copper films by in-situ SEM-SPM nanoindentation

Bo-hui ZHAO,Yan-ping LIU,Jin-yao MA,Jin WANG,Jun-xia Lü,Yue-fei ZHANG
DOI: https://doi.org/10.3969/j.issn.1000-6281.2017.05.004
2017-01-01
Abstract:In this paper, based on the Hertzian contact theory and King model, the elastic modulus of ultra-thin copper film with thickness of 40, 60, 80 nm deposited by direct current magnetron sputtering ( DCMS) and atomic deposition ( ALD) in the Si of (100) direction were investigated by scanning electron microscopy-scanning probe microscopy ( SEM-SPM) combined system. It has been found that the elastic modulus of Cu films with various thicknesses deposited by DCMS and ALD were obtained as from (95 ± 2) GPa to (125 ± 4)GPa and from (99 ± 2)GPa to (154 ± 6)GPa, and they are 6% ~71% larger than that of their bulk counterpart (90 GPa) . Furthermore, the elastic modulus of Cu films, either deposited by DCMS or by ALD, are closely related to the film thickness and decreases linearly with the increase of film thickness. In the case of same thickness, elastic modulus of the films obtained by ALD show 4. 2% ~23. 2% higher than those obtained by DCMS because of smaller grain size.
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