Study on the Effect of Oblique Sputtering on TbFe Thin Films by MFM

CHEN Kun,WANG Zhi-hong,ZHANG Jin-ping,ZHOU Yu
DOI: https://doi.org/10.3321/j.issn:1001-9731.2004.z1.940
2005-01-01
Abstract:Magnetic force microscopy(MFM) is a powerful technique in the research of the surface domains and used to study the soft magnetic sample. TbFe thin film is magnetostrictive, and has been widely used. To fulfill the practical requirement, its easy-axis of magnetization should be parallel to the film surface to reduce the in-plane saturation field H_S. The oblique sputtering technology has been applied in fabrication of TbFe thin film to reduce the H_S. The magnetic hysteresis loop of obliquely deposited TbFe films was measured,and shows that, with the increasing of the deposition angle, the easy-axis of magnetization was deflected rather than being vertical to the film. Magnetic domains of the TbFe films with different deposition angles were studied by magnetic force microscopy. The results indicate that the easy direction of magnetization was changed from out-of-plane to in-plane by obliquely deposition. It is consistent with the result that the easy-axis of magnetization would switch, measured by means of magnetic hysteresis loop.
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