Photosynthetic responses of flag leaf in the filling stage of winter wheat to light intensity and vernalization

Hai XIAO,Haijun LIU,Weizhe LIU,Guoping SHU,Xuelei JIAO,Xiaoying LIU,Zhigang XU
DOI: https://doi.org/10.7685/jnau.201702014
2017-01-01
Abstract:[Objectives] The aim of this study is to study the reasonable light intensity for winter wheat in the filling stage in artificial controllable environment.[Methods] The wheat variety'Yangmai 16'was used as the experimental material.We set up four treatments:artificial light (650 μmol · m-2 · s-1) + natural vernalization (T1),artificial light (500 μmol · m-2 · s-1) + natural vernalization (T2),artificial light (650 μmol· m-2· s-1) +seed vernalization (T3),artificial light (500 μmol · m-2· s-1) + seed vernalization (T4),and natural light+natural vernalization was used as control(CK).The photosynthetic responses of flag leaf in the filling stage of winter wheat to light intensity and vernalization way were investigated.[Results] The results showed that the 1 000-grain weight,relative increase of flag leaf Pn(VPn) and transpiration rate of four treatments were greater than those of CK treatment.The maximum net photosynthetic rate (Pmax) of T3 and T4 were greater than that of T1,T2 and CK.The light saturation point(LSP) of T1 treatment was greater than T2,and T3 was greater than T4.The light compensation point (LCP)and dark respiration rate (Rd)of T2 were lower than T1,and T4 were lower than T3.The stomatal conductance(Gs)of T1 treatment was greater than T2,and T3 was greater than T4.The Gs of flag leaf of T3 and T4 were greater than T1 and T2.[Conclusions] The light intensity of 500-650 μmol,m-2· s-1 was the reasonable light intensity parameter for the growth and development of'Yangmai 16'in the filling stage in artificial controllable environment.
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