Latest Progress of Dielectric/Metal/Dielectric Transparent Conductive Thin Films

Kang Zhang,Xiangqian Chu,Lihua Liu,Lei Wan,Jinjun He,Huanhuan Li,Yingcui Fang
DOI: https://doi.org/10.13922/j.cnki.cjovst.2017.11.07
2017-01-01
Abstract:We tentatively reviewed the latest advance of the dielectric /metal/dielectric(D/M/D)transparent conductive thin film material,particularly the extensively investigated TiO 2/Ag/TiO2(T/A/T)coatings as a good substitute for the currently widely used indium-tin-oxide(ITO)electrodes in advanced flexible opto-electronic de-vices,including but not limited to the flat-panel displays and organic solar cells.The discussions centered on the mechanisms responsible for its transparency and conductivity,synthesis and annealing conditions of the D/M/D multi-layered,and the impact of the localized surface plasmon resonance originated from the Ag layer on the opto-e-lectronic properties of the D/M/D multi-layered coating.In addition,the existing problems,possible solutions and development trends of the D/M/D multi-layered coatings were also briefly discussed in a thought provoking way.
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