Chemical Properties of SiH_4

WO Yin-hua,WANG Shao-nan,YU Jing-song

DOI: https://doi.org/10.3969/j.issn.1007-7804.2005.04.007

2005-01-01

Abstract:Silane is a flammable and explosive hazardous gas. Being a strong reducible agent, it can react violently with oxidant, such as alkalis and salt solutions of heavy metals. Detailed introduce the basic properties of silane.

What problem does this paper attempt to address?

Intramolecular Halogen Stabilization of Silylium Ions Directs Gearing Dynamics.

Paola Romanato,Simon Duttwyler,Anthony Linden,Kim K. Baldridge,Jay S. Siegel

DOI: https://doi.org/10.1021/ja9109665

IF: 15

2010-01-01

Journal of the American Chemical Society

Abstract:2,6-Bis(2,6-difluorophenyl)phenyldimethylsilanium ion (1a) adopts a ground-state C(2) trigonal-bipyramidal geometry in which fluorines from opposing 2,6-difluorophenyl groups coordinate to the apical positions of the pentavalent silyl cation. Exchange of fluorine at silicon occurs by a disrotatory gearing mechanism wherein one fluorine remains coordinated to silicon throughout the circuit. The "cogwheel" transition state is C(s)-symmetric, with one ring having a dihedral angle of 0 degrees and the other a dihedral angle of 90 degrees. This correlated dynamic process is a function of the coordinating halogen. The chloro derivative (1b) adopts a similar ground-state geometry, but exchange of chlorine at silicon follows a conrotatory process.
Hazardous Property of Silane and Recommendations for Safe Operation

Yin-hua WO,Yong WANG,Kui-hong YAO

DOI: https://doi.org/10.3969/j.issn.1003-3033.2004.12.012

2004-01-01

Abstract:As a hazardous gas source to provide silicon composition, silane has been extensively used in the manufacture of micro-electronic, photovoltaic devices and polycrystalline silicon. Its potential applications are prospective. With the use of silane more widely, its safe handling and treatment become a critical problem. A review of recent studies of silane ignition behavior and analyses of incidents with silane indicated that its hazardous behavior stems from its extreme reactivity with oxygen; spontaneous ignition, low ignition limit, and high combustion energy. Because of the sensitive auto-ignition of silane, it is necessary to eliminate any possibility of contact with oxygen for preventing fire. The same important issue is to avoid mixing or releasing silane with air into a confined space to form an unstable detonable gas pocket. Based on research and practice results, recommendations for safe using and handling of silane are presented.
Formal SiH4 chemistry using stable and easy-to-handle surrogates

Antoine Simonneau,Martin Oestreich

DOI: https://doi.org/10.1038/nchem.2329

IF: 24.274

2015-08-24

Nature Chemistry

Abstract:Monosilane (SiH4) is far less well behaved than its carbon analogue methane (CH4). It is a colourless gas that is industrially relevant as a source of elemental silicon, but its pyrophoric and explosive nature makes its handling and use challenging. Consequently, synthetic applications of SiH4 in academic laboratories are extremely rare and methodologies based on SiH4 are underdeveloped. Safe and controlled alternatives to the substituent redistribution approaches of hydrosilanes are desirable and cyclohexa-2,5-dien-1-ylsilanes where the cyclohexa-1,4-diene units serve as placeholders for the hydrogen atoms have been identified as potent surrogates of SiH4. We disclose here that the commercially available Lewis acid tris(pentafluorophenyl)borane, B(C6F5)3, is able to promote the release of the Si–H bond catalytically while subsequently enabling the hydrosilylation of C–C multiple bonds in the same pot. The net reactions are transition-metal-free transfer hydrosilylations with SiH4 as a building block for the preparation of various hydrosilanes.

chemistry, multidisciplinary
Potential Hazards of SiH4:N2 Mixture with Lean Oxygen

沃银花,王少楠,余京松

DOI: https://doi.org/10.3969/j.issn.1007-7804.2004.01.008

2004-01-01

Abstract:Silane is pyrophoric and acutely active with oxygen.However,coexistence of silane with low content oxygen is possible.To clarify ignition behavior of silane:nitrogen mixture,an explosion case was investigated.It is found that the explosion severity of the metastable mixture with lean oxygen is extremely high.
Silole‐containing Poly(silylenevinylene)s: Synthesis, Characterization, Aggregation‐enhanced Emission, and Explosive Detection

Zujin Zhao,Tao Jiang,Yanju Guo,Liyuan Ding,Bairong He,Zhengfeng Chang,Jacky W. Y. Lam,Jianzhao Liu,Carrie Y. K. Chan,Ping Lu,Liwen Xu,Huayu Qiu,Ben Zhong Tang

DOI: https://doi.org/10.1002/pola.26006

2012-01-01

Abstract:Hydrosilylation polymerizations of 1,1-dimethyl-2,5-bis(4-ethynylphenyl)-3,4-diphenylsilole with aromatic silylhydrides including 1,4-bis(dimethylsilyl)benzene, 4,4'-bis(dimethylsilyl) biphenyl, 2,5-bis(dimethylsilyl) thiophene, and 2,7-bis(dimethylsilyl)-9,9-dihexylfluorene in the presence of Rh(PPh3)(3)Cl catalyst in refluxed tetrahydrofuran afford a series of silole-containing poly(silylenevinylene)s. Under optimum condition, the alkyne polyhydrosilylation reactions progress efficiently and regioselectively, yielding polymers with high molecular weights (M-w up to 95,300) and good stereoregularity (E content close to 99%) in high yields (up to 92%). The polymers are processable and thermally stable, with high decomposition temperatures in the range of 420-449 degrees C corresponding to 5% weight loss. They are weakly fluorescent in the solution state but become emissive in the aggregate and film states, demonstrating their aggregation-enhanced emission characteristics. The explosive sensing capabilities of the polymers are examined in both solution and aggregate states. The emissions of the polymers aggregates in aqueous mixture are quenched more efficiently by picric acid in an exponential pattern with high quenching constants (up to 27,949 L mol(-1)), suggesting that the polymers aggregates are sensitive chemosensors for explosive detection. (C) 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 50: 2265-2274, 2012
Two-Dimensional Hierarchical Supramolecular Assembly of a Silole Derivative and Surface-Assisted Chemical Transformations

Lei Dong,Weihua Wang,Tao Lin,Katharina Diller,Johannes V. Barth,Jianzhao Liu,Ben Zhong Tang,Florian Klappenberger,Nian Lin

DOI: https://doi.org/10.1021/acs.jpcc.5b00116

2015-01-01

The Journal of Physical Chemistry C

Abstract:The bonding and organization of 1,1,2,3,4,5-hexaphenysilole (HPS) molecules adsorbed on Cu(111) and Ag(111) surfaces has been investigated using low-temperature scanning tunneling microscopy and X-ray photoelectron spectroscopy. In room-temperature-prepared samples, HPS molecules form extended networks that exhibit hierarchical organization stabilized by pi-pi interaction between exocyclic phenyl groups. After 430 K annealing on Cu(111), the compound is chemically altered as evidenced by Si 2p core level shift. This change is accompanied by a different adsorption configuration and a transformation of the assembled structures from networks to uniformly sized chiral clusters. The clusters, each composed of three molecules, are dispersively distributed on the surface. Monte Carlo simulations signal that this new phase can be understood as a result of competing long-range repulsions and short-range attractions. After even higher annealing at 520 K, the clusters dissolve and the exocyclic phenyl moieties undergo a cyclodehydrogenation reaction to form a polycyclic aromatic compound incorporating a silole moiety. In sharp contrast, on Ag(111), the HPS molecules do not show these changes but desorb from the surface at elevated temperatures. Our results demonstrate that the two-dimensional supramolecular assembly of intact HPS is insensitive to the choice of substrate at room temperature, but at high temperatures, the substrates chemical activity can induce selective chemical transformations resulting in a significantly different assembly behavior.
Velocity and Stability of Condensed Polymorphic SiH4: A High-Temperature High-Pressure Brillouin Investigation*

Jiayu Wang,Qiang Zhou,Siyang Guo,Yanping Huang,Xiaoli Huang,Lu Wang,Fangfei Li,Tian Cui

DOI: https://doi.org/10.1088/0256-307x/37/6/066201

2020-01-01

Chinese Physics Letters

Abstract:Silane (SiH4) is a promising hydrogen-rich compound for pursing high temperature superconducting. Previous high pressure measurements of Raman, x-ray diffraction and theoretical studies on SiH(4)mainly focused on its polymorphic structures above 50 GPa, while the structure and the stability under lower pressure range are still unclear. Here we report an investigation of condensed SiH(4)by Brillouin scattering measurements at high temperature up to 407 K and high pressure up to 18 GPa. Brillouin scattering frequencies of fluid SiH(4)under compression are obtained under isothermal conditions of 300 K, 359 K and 407 K. The SiH(4)becomes unstable with increasing temperature and subsequently decomposes into silicon and H-2. We find that compression at room temperature induces two velocity anomalies corresponding to a fluid-solid state transition and a phase IV to phase V transition, respectively. Brillouin scattering spectra has been a powerful tool to investigate the fruitful phases and structure transitions in the hydrogen-rich compound under extreme conditions.
High-pressure Synthesis, Amorphization, and Decomposition of Silane.

Michael Hanfland,John E. Proctor,Christophe L. Guillaume,Olga Degtyareva,Eugene Gregoryanz

DOI: https://doi.org/10.1103/physrevlett.106.095503

IF: 8.6

2011-01-01

Physical Review Letters

Abstract:By compressing elemental silicon and hydrogen in a diamond anvil cell, we have synthesized polymeric silicon tetrahydride (SiH(4)) at 124 GPa and 300 K. In situ synchrotron x-ray diffraction reveals that the compound forms the insulating I4(1)/a structure previously proposed from ab initio calculations for the high-pressure phase of silane. From a series of high-pressure experiments at room and low temperature on silane itself, we find that its tetrahedral molecules break up, while silane undergoes pressure-induced amorphization at pressures above 60 GPa, recrystallizing at 90 GPa into the polymeric crystal structures.
Hydrogen segregation and its roles in structural stability and metallization: silane under pressure

Wenwen Cui,Jingming Shi,Hanyu Liu,Yansun Yao,Hui Wang,Toshiaki Iitaka,Yanming Ma

DOI: https://doi.org/10.1038/srep13039

IF: 4.6

2015-08-12

Scientific Reports

Abstract:AbstractWe present results from first-principles calculations on silane (SiH4) under pressure. We find that a three dimensionalP-3 structure becomes the most stable phase above 241 GPa. A prominent structural feature, which separates theP-3 structure from previously observed/predicted SiH4structures, is that a fraction of hydrogen leaves the Si-H bonding environment and forms segregated H2units. The H2units are sparsely populated in the system and intercalated with a polymeric Si-H framework. Calculations of enthalpy of formation suggest that theP-3 structure is against the decomposition into Si-H binaries and/or the elemental crystals. Structural stability of theP-3 structure is attributed to the electron-deficient multicenter Si-H-Si interactions when neighboring silicon atoms are linked together through a common hydrogen atom. Within the multicenter bonds, electrons are delocalized and this leads to a metallic state, possibly also a superconducting state, for SiH4. An interesting outcome of the present study is that the enthalpy sum of SiH4(P-3 structure) and Si (fcc structure) appears to be lower than the enthalpy of disilane (Si2H6) between 200 and 300 GPa (for all previously predicted crystalline forms of Si2H6), which calls for a revisit of the stability of Si2H6under high pressure.

multidisciplinary sciences
Synthesis and Reactivity of N-Heterocyclic Silylene Stabilized Disilicon(0) Complexes

Shaozhi Du,Hongwei Jia,Hua Rong,Haibin Song,Chunming Cui,Zhenbo Mo

DOI: https://doi.org/10.1002/anie.202115570

2022-05-09

Abstract:Synthesis and reactivity of disilicon(0) complexes are of fundamental and application importance. Herein, we report the development of an N-heterocyclic imino-substituted silylene (1), which has strong σ-donating ability and is significantly sterically hindered. The one-pot reaction of this silylene with [IPr→SiCl2 ] (IPr=1,3-bis(2,6-diisopropylphenyl)-imidazol-2-ylidene) and KC8 (2 equiv) in THF at -30 °C leads to a silylene-ligated disilicon(0) complex (2), isolated as red crystals in 60 % yield. Characterization data and DFT calculations show that the trans-bent Si4 skeleton in 2 features a Si0 =Si0 double bond with significant π-π bonding and one lone pair of electrons on each of these two Si0 atoms. Complex 2 reacts readily with phenylacetylene, producing a structurally intriguing silatricyclic complex 6,8-diaza-1,2,5-trisilatricyclo-[3.2.1.02,7 ]-oct-3-ene (3), and revealing new aspects of low-valent silicon chemistry.
Gas-Phase Reactions Between Silane and Ammonia: A Theoretical Study

SW Hu,Y Wang,XY Wang,TW Chu,XQ Liu

DOI: https://doi.org/10.1021/jp035684m

2003-01-01

The Journal of Physical Chemistry A

Abstract:Gas-phase reactions between silane (SiH4) and ammonia (NH3) were investigated using ab initio calculations at the CCSD(T)/6-311++g**//MP2/6-31+G* level. Within the energy range of 180 kcal/mol, we located 34 equilibrium and 23 transition states on the potential energy surfaces of the Si-N-H systems. The initially weakly bonded molecular complex H3N-SiH4 eliminates the first hydrogen molecule (H-2) to form the Si-N bond three ways. The first route is through a dihydrogen-bonded transition state, over a barrier of 49.31 kcal/mol, leading directly to the most stable product silylamine (H2N-SiH3). The second route is through SiH4 dissociating into SiH2 and H-2, over a barrier of 57.47 kcal/mol, leading to the dative-bonded silylammonia complex H3N-SiH2. The third route is through a stepwise atomic dissociation and radical formation process, over a barrier of 131.21 kcal/mol, also leading to H3N-SiH2. With more energy, both H2N-SiH3 and H3NSiH2 are liable to further H2 or H elimination, leading to smaller species including molecules H2N-SiH, HN-SiH2, H3N-Si, HNSi, and HSiN and radicals H2N-SiH2, H3N-SiH, H2N-Si, and NSi. Dihydrogenbonded structures are also responsible for lowering barriers in these processes.
ChemInform Abstract: Reaction of Dilithio Reagents with PhSiH3: Formation of Siloles and 3‐Silacyclopentenes.

Baosheng Wei,Heng Li,Jianhao Yin,Wen‐Xiong Zhang,Zhenfeng Xi

DOI: https://doi.org/10.1002/chin.201606208

2016-01-01

ChemInform

Abstract:AbstractDepending on the solvent either siloles or silacyclopentenes are obtained.
How to make the ionic Si-O bond more covalent and the Si-O-Si linkage a better acceptor for hydrogen bonding

Simon Grabowsky,Maxie F Hesse,Carsten Paulmann,Peter Luger,Jens Beckmann

DOI: https://doi.org/10.1021/ic900074r

2009-05-18

Abstract:Variation of a bond angle can tune the reactivity of a chemical compound. To exemplify this concept, the nature of the siloxane linkage (Si-O-Si), the most abundant chemical bond in the earth's crust, was examined using theoretical calculations on the molecular model compounds H(3)SiOSiH(3), (H(3)Si)(2)OHOH, and (H(3)Si)(2)OHOSiH(3) and high-resolution synchrotron X-ray diffraction experiments on 5-dimethylhydroxysilyl-1,3-dihydro-1,1,3,3-tetramethyl-2,1,3-benzoxadisilole (1), a molecular compound that gives rise to the formation of very rare intermolecular hydrogen bonds between the silanol groups and the siloxane linkages. For theoretical calculations and experiment, electronic descriptors were derived from a topological analysis of the electron density (ED) distribution and the electron localization function (ELF). The topological analysis of an experimentally obtained ELF is a newly developed methodology. These descriptors reveal that the Si-O bond character and the basicity of the siloxane linkage strongly depend on the Si-O-Si angle. While the ionic bond character is dominant for Si-O bonds, covalent bond contributions become more significant and the basicity increases when the Si-O-Si angle is reduced from linearity to values near the tetrahedral angle. Thus, the existence of the exceptional intermolecular hydrogen bond observed for 1 can be explained by its very small strained Si-O-Si angle that adopts nearly a tetrahedral angle.
Synthesis of an Isolable Bis(silylene)-Stabilized Silylone and Its Reactivity Toward Small Gaseous Molecules

Yuwen Wang,Miriam Karni,Shenglai Yao,Alexander Kaushansky,Yitzhak Apeloig,Matthias Driess

DOI: https://doi.org/10.1021/jacs.9b06603

2019-08-14

Abstract:The first bis(N-heterocyclic silylene)-stabilized zero-valent silicon compound, [SiII(Xant)SiII]Si0 (4, Xant = 9,9-dimethyl-xanthene-4,5-diyl), has been synthesized via the reduction of the corresponding chlorosilyliumylidene chloride precursor {[SiII(Xant)SiII]SiCl}+Cl- (2). The electronic structure of silylone 4, whose molecular structure is confirmed spectroscopically and crystallographically, is investigated by DFT calculations and Natural Bond Orbital analysis, showing two perpendicular lone-pairs of electrons on the central Si0 atom, i.e., an sp0.41-type lone-pair and a delocalized p lone-pair. With the electron-rich and oxophilic Si0 center, silylone 4 exhibits a striking reactivity toward small gaseous molecules. Remarkably, the oxidation of silylone 4 by N2O can be controlled to generate distinct products by regulating the amount of added N2O. Exposing 4 to an excess or two molar equivalents of N2O yields the unexpected oxidation product 5, bearing a central six-membered Si4O2 ring. When 4 is mixed with one molar equivalent of N2O, the unique compound 6 is obtained, resulting from a rare 1,4-addition of two central silicon atoms to a phenyl ring of an amidinate ligand coordinated to the SiII atom. In addition, cleavage of the strong N-H bond in ammonia is also readily accomplished by silylone 4, representing the first example of NH3 activation in silylone chemistry. In the presence of the Lewis acid BPh3, silylone 4 achieves heterolytic dihydrogen cleavage and ethylene addition to form the corresponding hydridosilyliumylidene hydroborate salt 8 and the zwitterionic compound 9, respectively, which represent a new type of frustrated Lewis pair based on an electron-rich Si0 donor and a borane acceptor.
Structure And Dynamic Properties Of Neutral And Ionized Sih5 And Si2h3

X.G. Gong,D. Guenzburger,E.B. Saitovitch

DOI: https://doi.org/10.1016/S0009-2614(97)00750-1

IF: 2.719

1997-01-01

Chemical Physics Letters

Abstract:The equilibrium structures and dynamical properties of neutral and ionized SiH5, and Si2H3 have been studied using the ab initio molecular dynamics method. The obtained equilibrium structures are in good agreement with other highly precise methods. In SiH5+, we have clearly observed that H-2 rotates about the C-3 axis. In Si2H3+, we have found that H atoms can interchange positions frequently and also the structure changes. The different dynamical behaviors of the Si-H and C-H molecules has been addressed. (C) 1997 Published by Elsevier Science B.V.
Gas Phase Reactions Between Sih4 and B2h6: A Theoretical Study

SW Hu,Y Wang,XY Wang

DOI: https://doi.org/10.1021/jp027113k

2003-01-01

Abstract:Gas-phase reactions of silane (SiH4) and diborane (B2H6) are investigated using ab initio calculations at the MP2/6-311++g** level. Initially SiH4 and B2H6 are only weakly attracted to each other. Under thermal activation, the two molecules can overcome an energy barrier of 33.87 kcal/mol to associate into a complex SiH4-BH3-BH3 with a hydrogen-bridged Si-H-B bond. Upon bonding, one of the two hydrogen-bridged bonds B-H-B in B2H6 is broken and the other becomes polarized. Started from the SiH4-BH3-BH3 complex, three comparable fragmentation pathways involving BH3 and H-2 elimination produce several silaboranes with various silicon-boron-hydrogen ratios. A much higher barrier exists between the initial loosely bonded SiH4-B2H6 system and a direct H-2 elimination product SiH3-B2H5 with C-s symmetry. The bonding nature in, the species are further elucidated through topological analysis of electron density using the AIM theory. These intermediate silaboranes are possible precursors for chemical vapor deposition in fabricating boron doped silicon films. Their composition and polarity may determine their tendency of surface adsorption and the properties of the relevant solid. The proposed mechanisms can help to understand and control the initial gas-phase reactions in practice. Calculated IR spectra, dipole moment, and rotational constants of the species are provided to facilitate experimental investigations.
Crystal Structure of SiH4 at High Pressure

Olga Degtyareva,Miguel Martinez Canales,Aitor Bergara,Xiao-Jia Chen,Yang Song,Viktor V. Struzhkin,Ho-kwang Mao,Russell J. Hemley

DOI: https://doi.org/10.1103/physrevb.76.064123

IF: 3.7

2007-01-01

Physical Review B

Abstract:The crystal structure of a high-pressure phase of silane (SiH4), observed between 10 and 25 GPa, is solved using powder synchrotron x-ray diffraction and shown to be of the SnBr4 type. The phase is an insulating molecular solid with a monoclinic unit cell containing four tetrahedrally bonded molecules, space group P2(1)/c. Ab initio calculations show the SnBr4-type structure to be favored in this pressure range relative to other recently proposed structures. The fit of the pressure dependence of volume to the Birch-Murnagham equation of state gives the following parameters at ambient pressure if K-0(') is fixed to 4: V-0=250(9) A(3) and K-0=7.8(9) GPa for the experimental data, and V-0=255(2) A(3) and K-0=6.1(2) GPa for the data obtained from ab initio calculations.
Theoretical Investigation on H-Abstraction Reactions of Silanes with H and CH 3 Attacking: A Comparative Study with Alkane Counterparts

Qilong Fang,Yan Zhang,Jingxian Xia,Yuyang Li

DOI: https://doi.org/10.1021/acsomega.1c07031

IF: 4.1

2022-02-02

ACS Omega

Abstract:Silicon-based organic precursors are widely applied in the vapor-fed flame synthesis of monocrystalline silicon, silicon dioxide, and silicon nitride. Due to the lack of kinetic investigations on reactions of silicon-based organic precursors, rate constants were usually analogized to those of their hydrocarbon counterparts. Investigations on the similarities and differences between the two types of compounds become necessary. This work reports a comparative theoretical investigation on H-abstraction reactions with H and CH3 attacking for silanes and their alkane counterparts, including silane and methane, disilane, methylsilane and ethane, dimethylsilane and propane, trimethylsilane and iso-butane, and tetramethylsilane and neo-pentane at the domain-based local pair natural orbital coupled cluster with perturbative triple excitations (DLPNO-CCSD(T))/cc-pVTZ//M06–2X/cc-pVTZ level. The rate constants were calculated using the conventional transition-state theory coupled with the asymmetric Eckart tunneling corrections over 600–2000 K. The calculated results show that dramatic discrepancies exist between H-abstraction from silicon sites in silanes and equivalent carbon sites in their alkane counterparts with H and CH3 attacking. The H-abstraction reactions from the primary carbon sites in silanes have generally lower barrier energies than the similar reactions in their alkane counterparts, while those in methylsilane and dimethylsilane with H attacking are the only two with higher barrier energies. Electrostatic potential mapped molecular van der Waals surfaces were adopted to provide insight into the calculated trends in barrier energies. The H-abstraction reactions from silicon sites in silanes have much higher rate constants than those from equivalent carbon sites in their alkane counterparts, especially under low-temperature conditions, while the rate constants of H-abstraction reactions from primary carbon sites in silanes and their alkane counterparts show relatively strong analogy.This article has not yet been cited by other publications.

chemistry, multidisciplinary
Identification of Decomposition Reactions Forhmdsoorganosilicon Using Quantum Chemical Calculations

Yaosong Huang,Yugong Chen,Mingfei Zhou

DOI: https://doi.org/10.1002/qua.26415

2020-01-01

International Journal of Quantum Chemistry

Abstract:Hexamethyldisiloxane [HMDSO, (CH3)(3)-SiOSi-(CH3)(3)] is an important precursor for SiO(2)formation during flame-based silica material synthesis. As a result, HMDSO reactions in flame have been widely investigated experimentally, and many results have indicated that HMDSO decomposition reactions occur very early in this process. In this paper, quantum chemical calculations are performed to identify the initial decomposition of HMDSO and its subsequent reactions using the density functional theory at the level of B3LYP/6-311+G (d, p). Four reaction pathways-(a) Si-O bond dissociation of HMDSO, (b) Si-C bond dissociation of HMDSO, (c) dissociation and recombination of Si-O and Si-C bonds, and (d) elimination of a methane molecule from HMDSO-have been examined and identified. From the results, it is found that the barrier of 84.38 kcal/mol and Si-O bond dissociation energy of 21.55 kcal/mol are required for the initial decomposition reaction of HMDSO in the first pathway, but the highest free energy barrier (100.69 kcal/mol) is found in the third reaction pathway. By comparing the free energy barriers and reaction rate constants, it is concluded that the most possible initial decomposition reaction of HMDSO is to eliminate the CH(3)radical by Si-C bond dissociation.
Chemical modification of silicene

Rong Wang,Ming-Sheng Xu,Xiao-Dong Pi

DOI: https://doi.org/10.1088/1674-1056/24/8/086807

2015-08-01

Chinese Physics B

Abstract:Silicene is a two-dimensional (2D) material, which is composed of a single layer of silicon atoms with sp2–sp3 mixed hybridization. The sp2–sp3 mixed hybridization renders silicene excellent reactive ability, facilitating the chemical modification of silicene. It has been demonstrated that chemical modification effectively enables the tuning of the properties of silicene. We now review all kinds of chemical modification methods for silicene, including hydrogenation, halogenation, organic surface modification, oxidation, doping and formation of 2D hybrids. The effects of these chemical modification methods on the geometrical, electronic, optical, and magnetic properties of silicene are discussed. The potential applications of chemically modified silicene in a variety of fields such as electronics, optoelectronics, and magnetoelectronics are introduced. We finally envision future work on the chemical modification of silicene for further advancing the development of silicene.

physics, multidisciplinary

Chemical Properties of SiH_4

Intramolecular Halogen Stabilization of Silylium Ions Directs Gearing Dynamics.

Hazardous Property of Silane and Recommendations for Safe Operation

Formal SiH4 chemistry using stable and easy-to-handle surrogates

Potential Hazards of SiH4:N2 Mixture with Lean Oxygen

Silole‐containing Poly(silylenevinylene)s: Synthesis, Characterization, Aggregation‐enhanced Emission, and Explosive Detection

Two-Dimensional Hierarchical Supramolecular Assembly of a Silole Derivative and Surface-Assisted Chemical Transformations

Velocity and Stability of Condensed Polymorphic SiH4: A High-Temperature High-Pressure Brillouin Investigation*

High-pressure Synthesis, Amorphization, and Decomposition of Silane.

Hydrogen segregation and its roles in structural stability and metallization: silane under pressure

Synthesis and Reactivity of N-Heterocyclic Silylene Stabilized Disilicon(0) Complexes

Gas-Phase Reactions Between Silane and Ammonia: A Theoretical Study

ChemInform Abstract: Reaction of Dilithio Reagents with PhSiH3: Formation of Siloles and 3‐Silacyclopentenes.

How to make the ionic Si-O bond more covalent and the Si-O-Si linkage a better acceptor for hydrogen bonding

Synthesis of an Isolable Bis(silylene)-Stabilized Silylone and Its Reactivity Toward Small Gaseous Molecules

Structure And Dynamic Properties Of Neutral And Ionized Sih5 And Si2h3

Gas Phase Reactions Between Sih4 and B2h6: A Theoretical Study

Crystal Structure of SiH4 at High Pressure

Theoretical Investigation on H-Abstraction Reactions of Silanes with H and CH 3 Attacking: A Comparative Study with Alkane Counterparts

Identification of Decomposition Reactions Forhmdsoorganosilicon Using Quantum Chemical Calculations

Chemical modification of silicene