Abstract:Using plasma-enhanced chemical vapor deposition (PECVD), a series of diamond-like carbon (DLC) films were prepared on YG8 carbide substrate by changing the enhancement mode and the negative bias voltage of the substrate. The structure and properties of the deposited films were tested by a series of analytical and testing instruments. During the deposition of DLC films, the ability of electrons to collide and ionize the gas is enhanced by increasing the number of electrons and extending the movement path of electrons, which is called electron-assisted enhanced gas ionization. Four different experimental modes (A mode, B mode, C mode, D mode) were set up. Different experimental modes have different degrees of electron-assisted enhancement ability of gas ionization, so different experimental modes are called different enhancement modes. The ions ionized by the electrons participate in the deposition of the film under the traction of the negative bias voltage of the substrate. The results show that: when depositing diamond-like carbon films, the energy of the ion beam is indirectly affected by electron collisions in different enhancement modes and directly affected by the negative bias voltage of the substrate. The higher the enhancement mode, the higher the ion beam energy. The higher the substrate negative bias voltage, the higher the ion beam energy generated by gas source discharge. Under the dual action of enhancement mode and substrate negative bias voltage, the total energy of ions involved in deposition should not be too high or too low, and the synergy of the two makes the properties and quality of the deposited film reach a better value. For industrial large-scale production of tool protection film for cutting aluminum alloy, it is more suitable for high enhancement mode and low negative bias voltage production. Through a series of process optimization to improve and enhance the comprehensive performance of DLC film, it is further applied to the actual processing application field, which has great industrial and social value to realize the large-scale application of DLC film in the field of hard to cut metal processing.

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Effect of Pulsed Substrate Bias on Evolution of Surface Morphology and Sp(3) Hybridization Degree of Ag-Dlc Films in A Mid-Frequency Dual-Magnetron Sputtering

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Effect of Pulsed Bias on Chemical Structure of DLC Films Prepared by Plasma Processing

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Effect of Discharge Parameters on Properties of Diamond-Like Carbon Films Prepared by Dual-Frequency Capacitively Coupled Plasma Source

Microstructure, Mechanical and Tribological Properties of Si and Al Co-Doped Hydrogenated Amorphous Carbon Films Deposited at Various Bias Voltages