Rigorous electromagnetic field model based on waveguide method for 3D thick resist lithography simulation

Yuxin Wang,Zaifa Zhou,Jie Hua,Fei Wang,Huanwen Xu,Qing’an Huang

DOI: https://doi.org/10.11884/HPLPB201628.064102

2016-01-01

Abstract:SU-8 thick resist lithography has become the mainstream technology for structures with high aspect ratio in the micro-electro-mechanical system (MEMS)and integrated circuits (ICs).So as to replace ex-pensive and time-consuming lithographic experiments,lithography simulation becomes an increasingly valuable tool for predicting results and optimizing manufacture process.A three-dimensional (3D)lithography simula-tion model is developed for the ultraviolet (UV)process of SU-8 resist.The model utilizes waveguide (WG) method based on rigorous electromagnetic field theory,which is more comprehensive than its two-dimension counterparts.Using this model,the light intensity distribution and morphology of photoresist after develop-ment process can be stereoscopically predicted.A series of simulations and experiments have been conducted to verify the validity of the model.The study is carried out on SU-8 under UV source with 365 nm and 2.6 mW/cm2 .Simulation results are given by cross section image and stereogram combined with corresponding experi-mental outcome.The results confirm the validity of the simulation model and prove that the 3D hybrid model is faster than other methods and remains accurate.