Fabric Defect Detection Based on Wavelet Lifting Scheme

GUAN Sheng-qi,SHI Xiu-hua
DOI: https://doi.org/10.3778/j.issn.1002-8331.2008.25.066
2008-01-01
Abstract:To fabric defect detection of rapidity and accuracy,a new method for defect detection based on wavelet lifting scheme is presented.Firstly,according to known the set of finite filters,the new wavelet with matching fabric texture properties is constructed by improving Vanishing Moments.Secondly,the set of construction wavelet filters are followed by lifting and dual lifting,and different lifting operators and dual lifting operators are obtained to wavelet decomposition.Lastly,the detail signal after wavelet decomposition is extracted,and it is compared with the detail signal of normal fabric to detect defect.The experimental result confirms that the proposed method is validity and feasibility,and the detection accuracy rate is over 92.5%.
What problem does this paper attempt to address?