Corrosion Resistance of Passive Film Formed on TA10 Dental Implant in Simulated Body Fluid

Junjie Zhao,Ming Liu,Baochun Tan,Yanxiao Zhang
DOI: https://doi.org/10.20964/2021.02.43
IF: 1.541
2021-01-01
International Journal of Electrochemical Science
Abstract:The passive behavior of TA10 dental implant was systematacially studied by measuring open circuit potential (OCP), potentiodynamic polarization, electrochemical impedance spectroscopy (EIS) and Mott-Schottky (MS) curves in simulated body fluid (SBF) for different immersion times. The results showed that the OCP of TA10 dental implant is positively shifted with the extension of immersion time, and stabilizes at about 35 mV(SCE) after immersing for 1 day; the typical metal passive polarization curve could be observed in SBF with a wide passive potential range, the maintaining passivity and the self-corrosion current density of the TA10 implant decreases with the extension of immersion time and the self-corrosion current density decreased to 0.07 mu A/cm(2) after 3 days of immersion; the EIS impedance modulus of the passive film is about 10(5) Omega.cm(2) order of magnitude at the initial stage of immersion and increases sharply with extension of immersion times and finally stabilizes at about 3 x 10(6) Omega.cm(2) after 3 days of immersion; the passive film is characterized by n-type semiconductor and the number of defects decreases with the extension of immersion time, a stable corrosion resistant passive film of TA10 implant could be formed after 3 days of immersion.
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