Effect of Nitrogen Capture Ability of Quantum Dots on Resistive Switching Characteristics of AlN-based RRAM

Yiwei Duan,Haixia Gao,Jingshu Guo,Mei Yang,Zhenxi Yu,Xuping Shen,Shuliang Wu,Yuxin Sun,Xiaohua Ma,Yintang Yang
DOI: https://doi.org/10.1063/5.0031056
IF: 4
2021-01-01
Applied Physics Letters
Abstract:This Letter studies the effect of the nitrogen capture ability of quantum dots on resistive switching characteristics of AlN-based resistive random access memory. We prepared a single layer AlN device and four types of AlN/PbS quantum dot stacked structure devices with different concentrations. Compared with the single layer AlN device, the AlN/PbS quantum dot stacked structure devices exhibit excellent resistive switching characteristics, such as forming-free, low power consumption, and excellent stability. We propose that the resistive switching process is determined by the migration of nitrogen ions and the lead sulfide (PbS) quantum dot layer as a natural nitrogen ion reservoir, which can improve the resistive switching characteristics. Moreover, the size of the natural nitrogen ion reservoir can be modulated by changing the concentration of quantum dots.
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