Dv/dt Induced Failure and Improvement of Power Superjunction MOSFET

Min Ren,Qiao Guo,Qingying Lei,Xin Zhang,Wei Li,Fang Zheng,Songrong Wu,Wei Gao,Zehong Li,Bo Zhang
DOI: https://doi.org/10.1109/ipfa49335.2020.9260861
2020-01-01
Abstract:The failure Mechanism of Power Superjunction MOSFET (SJ-MOS) under high dv/dt is analyzed. Simulations show that the design of P/N pillars in the drift region of SJ-MOS is significant to the dv/dt induced failure. By optimizing the P/N pillars' width, doping concentration and doping distribution, the voltage and current overshoots in the switching process can be decreased, so as to improve the reliability of SJ-MOS.
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