Abstract:A new three-step method for preparing aluminum rich coating on HR-2 stainless steel was proposed, i.e. ambient temperature chloroaluminate melts electroplating followed by heat treating and artificial oxidation. In the electroplating process, aluminum deposition from AlCl3/MEIC to the surface of HR-2 steel was performed with a deposition rate of 15 mu m/h. Within the aluminizing temperature range from 650 to 750 degrees C, aluminizing time from 1 to 30 h, the aluminized coating with thickness of 3-27 mu m can be prepared, which is homogeneous and free of porosity or crack, and have good metallographic adherence to the substrate; the coating cross section exhibits a three-layer or two-layer structure. A simple Arrhenius relationship can be used to describe the effect of temperature on the coating growth rate, which gives activation energy of 116.9 kJ/mol. The relationship between the coating thickness against time(1/2) is approximately linear, which is a typical feature of the diffusion controlled coating growth mechanism. To form Al2O3 film on surface, the aluminized coating treated for 4 h was oxidized in 10(-2) Pa O-2 for 80 h and observed by X-ray photoelectron spectroscopy (XPS) and Reflection spectrum. The finally fabricated coating shows a double-layer structure consisting of an outer gamma-Al2O3 layer with thickness of 110 nm and inner (Fe,Cr,Mn and Ni)Al/(Fe,Cr,Mn and Ni)(3)Al layer of 30 mu m thickness, and is homogeneous without any defects. The deuterium permeation rate through the coated HR-2 steel is reduced by 3 orders of magnitude at 600 degrees C. The coating remains a perfect surface for 20 thermal cycles between 750 degrees C and room temperature. The method is a potential candidate for preparation of TPB on the tritium container surface in ITER.

Characteristics of Hydrogen Plasma Treatment on Al2O3/CrxOy/AlmOn Composite Film Via Al-ion-implantation and Ultra-Low Partial Pressure Oxidation

Hydrogen permeation behavior and mechanism of Cr2O3/Al2O3 bipolar oxide film under plasma discharging environment

Hydrogen Permeation Properties of CrxCy@Cr2O3/Al2O3 Composite Coating Derived from Selective Oxidation of a CrC Alloy and Atomic Layer Deposition

A new preparing method and performances of FeAl/Al2O3 tritium permeation barrier

Preparation and Characterization of Α-Al2o3 Film by Low Temperature Thermal Oxidation of Al8Cr5 Coating

Characteristic and behavior of an electrodeposited chromium (III) oxide/silicon carbide composite coating under hydrogen plasma environment

Preparation of Al-Cr-Fe Coatings by Heat Treatment of Electrodeposited Cr/Al Composite Coatings

Al-Cr Coatings Prepared by Diffusion at Low Temperature and Its Phase Characterization

Hydrogen Interaction Properties of Cr2O3 Passive Films Upon Helium Ions Irradiation

Enhanced Formation of Α-Al2o3 at Low Temperature on Cr/Al Coating by Controlling Oxygen Partial Pressure

Preparation of Cr2O3/Al2O3 bipolar oxides as hydrogen permeation barriers by selective oxide removal on SS and atomic layer deposition

A Mechanism for the Growth of a Plasma Electrolytic Oxide Coating on Al

Hydrogen Interaction Characteristics of a Cr2O3Y2O3 Coating Formed on Stainless Steel in an Ultra-Low Oxygen Environment

Effects of Heat Treatment on Structure Transformation of Cr/Al Composite Coatings

Enhanced corrosion resistance and mechanical properties of CrAlON coatings under alternating hydrostatic pressure

Effect of Helium Implantation on the Hydrogen Retention of Cr2O3 Films Formed in an Ultra-Low Oxygen Environment

Fundamental understanding on the microstructure and corrosion resistance of Cr-(Cr, Al)2O3 composite coatings in-situ synthetized by reactive plasma spraying

Improving hydrogen isotope permeation resistance of (TiVAlCrZr)O multi-component metal oxide coating by O + Ion implantation

Fabrication and Investigation on the Polyimide/Al2O3 Composite Films via Ion Exchange Technology

One-step preparation of α-Al2O3/SiO2 composite tritium permeation barrier via slurry spin coating method and performance investigation

Stability of Azo Thin Films under the Environment of Hydrogen Plasma