Chelation-Assisted Selective Etching Construction of Hierarchical Polyoxometalate-Based Metal–Organic Framework

Zhong Zhang,Yunwen Tao,Hongrui Tian,Qian Yue,Shumei Liu,Yiwei Liu,Xiaohui Li,Ying Lu,Zhixia Sun,Elfi Kraka,Shuxia Liu
DOI: https://doi.org/10.1021/acs.chemmater.0c00440
IF: 10.508
2020-01-01
Chemistry of Materials
Abstract:A chelation-assisted selective etching (CASE) strategy is developed to construct a hierarchical polyoxometalate-based metal-organic framework (POM@MOF). The selected chelator, ethylenediaminetetraacetic dianion (EdtaH(2)(2-)), can bind protons of the acid etchant to provide a low initial proton concentration. The dwindling protons are more controllable when localized at specific positions (e.g., polar crystal facets) of POM@MOF to initiate selective etching. Subsequently, with the liberated metal ions being chelated, the bound protons are gradually released in situ. The secondary release of protons results in a local high proton concentration (i.e., enrichment effect), thereby further enhancing the etch selectivity. When the amount of EdtaH(2)(2-) is controlled, POM@MOFs with different morphologies and pore structures are fabricated by selective etching. The on-demand storage and release of protons overcomes the traditional uncontrollability caused by direct proton addition. The CASE strategy provides a feasible way to design diverse hierarchical MOFs because of the universal chelation between EdtaH(2)(2-) and metal ions.
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