Morphology Engineering of Metal-Organic Frameworks by Facet-Selective Protection and Etching.

Hao Liu,Xianchun Chen,Lu Wang,Bo Wang
DOI: https://doi.org/10.1021/acs.inorgchem.4c02837
IF: 4.6
2024-08-14
Inorganic Chemistry
Abstract:Anisotropic etching is a novel and effective means to modulate facets of metal-organic frameworks (MOFs) which deserves continuous exploration. Herein, we developed a facet-selective protection and etching method to achieve morphology control of MOFs. Our approach exploits the compositional differences between the facets of zeolitic imidazolate framework-67 and the moderate coordinating and etching properties of ethylenediaminetetraacetic acid disodium salt (EdtaH2Na2). The selected chelator, EdtaH22-, can specifically coordinate with unsaturated metal sites on the {100} crystal planes, protecting them from proton etching and meanwhile releasing protons. Moreover, the released protons with locally high concentration led to the etching of the unprotected {110} facets, ultimately forming nanocrystals with selectively exposed surfaces. This anisotropic etching strategy facilitates the precise modification of MOF surfaces, which is anticipated to play a crucial role in enhancing their properties in different application areas.
Medicine,Materials Science,Engineering
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