Optimization and preparation of a visible-infrared compatible stealth film based on D/M/D structure

Saichao Dang,Zijun Wang,Hong Ye
DOI: https://doi.org/10.1088/2053-1591/ab3a5f
IF: 2.025
2019-01-01
Materials Research Express
Abstract:It is difficult for current camouflage coatings to realize visible-infrared-compatible stealth. To solve this problem, we develop a film based on a dielectric/metal/dielectric (D/M/D) structure, which shows a high visible (0.4 similar to 0.8 mu m) transmittance and a high infrared (3 similar to 14 mu m) reflectance (i.e., low emittance). When applied on a camouflage coating, because of the high visible transmittance and low infrared emittance of the film, visible-infrared-compatible stealth can be realized. The thickness of each layer of the ZnS/Ag/ZnS film is designed using the particle swarm optimization method. By thermal evaporation, this film is prepared on a quartz glass substrate with an average visible transmittance and infrared reflectance of 89% and 95%, respectively. According to the angle-dependent relationship of the spectral properties, both the visible transmittance and infrared reflectance are above 80% within a 60 degrees oblique incident angle. The visible reflectances of the sample on sandy and yellow-green camouflage coatings confirm the compatible visible stealth, while the radiative temperatures obtained by two thermal infrared imagers within the temperature range of 25 similar to 150 degrees C demonstrate infrared stealth performance.
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