Microstructure and High Temperature Oxidation Resistance of Mixed Long Si3N4 Nanowires with Wide Diameter Distribution

Feiyue Yang,Shuang Zhao,Zichun Yang,Guobing Chen,Kunfeng Li,Shuowei Yuan
DOI: https://doi.org/10.1088/2053-1591/ab51d8
IF: 2.025
2020-01-01
Materials Research Express
Abstract:Herein, the mixed α-Si3N4 nanowires with large diameter differences (35–400 nm) were prepared by repeated re-filling of nitrogen gas during high temperature nitridation, and the length thereof was substantially above 500 μm (the longest length even could reach centimeter level). And there were significant differences in the interplanar spacing and growth direction of α-Si3N4 nanowires with different diameters. Moreover, the high temperature oxidation resistance of nanowires were systematically analyzed and obtained the following results: the oxidation reaction of Si3N4 nanowires became intensified significantly at about 1100 °C, and the diffraction intensity of Si3N4 in XRD patterns decreased with the increase of oxidation temperature until it was substantially oxidized to SiO2 at about 1400 °C; and the changes in the microstructure of Si3N4 nanowires became more intense as the oxidation temperature increased until a significant shrinkage occurred at about 1400 °C, at which point it no longer exhibited a distinct nanowire morphology. The above studies may provide a reference for the further research and application of α-Si3N4 nanowires in the high temperature field.
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