Abstract:Superconductors are used in military and commercial applications due to the full diamagnetic and zero resistance properties. Hereinto, niobium nitride (NbN) has been extensively studied for its excellent superconducting properties, such as high transition temperature (T-c), large superconducting energy gap, narrow transition width and good stability. Superconducting NbN films are widely used in low temperature superconducting devices, for instance, hot electron bolometer, superconducting quantum interference devices and rapid single flux quantum. Especially, in 2001 Gol'tsman has successfully detected a single photon response of 810 nm near-infrared using an ultra-thin superconducting NbN, which proved that the high-quality growth of ultra-thin NbN film was the key step for high resolution and sensitivity of the superconducting detector. Up to now, atomic layer deposition (ALD), molecular beam epitaxy (MBE), pulsed laser deposition (PLD) and magnetron sputtering have been successfully used to grow NbN thin films. However, T-c is decreasing gradually as the reduced of thickness. Therefore, there is still a challenge to grow ultra-thin superconducting NbN film with high performance.In this work, 5 nm thickness of superconducting epitaxial NbN film has been grown on MgO < 100 > substrate by magnetron sputtering. We systematically study the effect of different sputtering parameters on the superconductivity properties of the NbN film. The experiment results show that the high vacuum, high sputtering temperature and low working pressure are positively correlated with the superconducting transition temperature of NbN film under the premise of suitable argon-nitrogen ratio or magnetron power. The analyses of physical property measurement system (PPMS) indicate that as-grown 5 nm-thick NbN film has high performance with a superconducting transition temperature as high as 12.5 K under the optimum condition. Morphologic characterizations show that the ultra-thin NbN films have high density and smoothness with 0.116 nm of the surface roughness. Microstructural measurements also illustrate the epitaxial growth of NbN on MgO substrate. This work demonstrates the ultra-thin NbN films can be well controllably grown with high quality and offers a platform to fabricate the ultra-thin superconducting devices in the coming future.

Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition

EFFECTS OF DEPOSITION TEMPERATURE ON PROPERTIES OF NIOBIUM FILMS DEPOSITED BY DC MAGNETRON SPUTTERING

Effects of Ambient Gasses on the Magnetic Properties of Fe84.8Zr3.4Nb3.4B7.4Cu1 Nanocrystalline Alloy

Effect Of Sputtering Gas Pressure On Wear Resistance And Corrosion Resistance Of Niobium Films Prepared By Magnetron Sputtering Deposition

Study of DC Magnetron Sputtered Nb Films

Influence Mechanism of RF Bias on Microstructure and Superconducting Properties of Sputtered Niobium Thin Films

Influence Of Different Sputtering Conditions On Superconductivity Of Ultra-Thin Epitaxial Niobium Nitride Film

The effect of niobium thin film structure on losses in superconducting circuits

Effects of gas property on quality of NiCoCrAlY coating by cold gas dynamic spraying

Study of Stress and Morphology of Superconducting Niobium Thin Films

Thickness effect on superconducting properties of niobium films for radio-frequency cavity applications

Effects of technological parameters in magnetron sputtering process on properties of metallized films

Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation

The Effect of N2 Partial Pressure on the Properties of Nb–Si–N Films by RF Reactive Magnetron Sputtering

Superiority of High Power Impulse Magnetron Sputtering in Niobium Films Deposition on Copper

Effect of the Deposition Parameters on the Mechanical Properties of Ti-B-C Films Deposited by Magnetron Sputtering

Effect of processing conditions on microstructure and electrical characteristics of Ni thin films

Resputtering effect during MgO buffer layer deposition by magnetron sputtering for superconducting coated conductors

Controlling the Superconducting Critical Temperature and Resistance of NbN Films through Thin Film Deposition and Annealing

Bias Voltage and Properties of Magnetron Sputtered Niobium Films