Research on Rapid Growth of Monolayer Graphene by Vertical Cold-Wall CVD Method

Kun Xu,Xiangyang Duan,Yan Li,Yinxiao Du,Peng Yang,Leiming Chen,Fanguang Zeng
DOI: https://doi.org/10.1080/17458080.2020.1818722
2020-01-01
Journal of Experimental Nanoscience
Abstract:Chemical vapor deposition (CVD) is one of the most important methods for the preparation of graphene. Graphene is usually prepared using horizontal tube CVD (HT-CVD) method. However, the preparation of this method is too long, generally more than 2 h. In this article, a method called vertical cold-wall CVD (VCW-CVD) method was introduced for graphene preparation. Due to the vertical angle between direction of gas flow and sample surface, the reaction process of this method for graphene preparation is only 1 min. Accordingly, in this article, the modified parameter of graphene preparation by this method was discussed. Besides, the VCW-CVD graphene had an equal quality with the HT-CVD graphene, which was proved by measurement of conductivity, transmittance and heat stability.
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