Superclean Growth of Graphene Using a Cold‐Wall Chemical Vapor Deposition Approach

Kaicheng Jia,Haina Ci,Jincan Zhang,Zhongti Sun,Ziteng Ma,Yeshu Zhu,Shengnan Liu,Junling Liu,Luzhao Sun,Xiaoting Liu,Jingyu Sun,Wanjian Yin,Hailin Peng,Li Lin,Zhongfan Liu
DOI: https://doi.org/10.1002/anie.202005406
2020-01-01
Angewandte Chemie International Edition
Abstract:Chemical vapor deposition (CVD) has become a promising approach for the industrial production of graphene films with appealing controllability and uniformity. However, in the conventional hot-wall CVD system, CVD-derived graphene films suffer from surface contamination originating from the gas-phase reaction during the high-temperature growth. Shown here is that the cold-wall CVD system is capable of suppressing the gas-phase reaction, and achieves the superclean growth of graphene films in a controllable manner. The as-received superclean graphene film, exhibiting improved optical and electrical properties, was proven to be an ideal candidate material used as transparent electrodes and substrate for epitaxial growth. This study provides a new promising choice for industrial production of high-quality graphene films, and the finding about the engineering of the gas-phase reaction, which is usually overlooked, will be instructive for future research on CVD growth of graphene.
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