Fabrication Of Silica And Titania Anti-Coking Passivation Layers In High Aspect-Ratio Tubular Reactors By Atomic Layer Deposition

Hui Longfei,Li Jianguo,Gong Ting,Sun Daoan,Lu Jian,Hu Shenlin,Feng Hao
DOI: https://doi.org/10.7503/cjcu20180374
2019-01-01
Abstract:Silica and titania thin films were deposited inside the micro channels of stainless steel tubular reactors by atomic layer deposition ( ALD ) to suppress the metal catalyzed coke formation during thermal cracking of hydrocarbon fuels. Quartz crystal microbalance measurements reveal that the average film growth rate is 0. 15 nm/cycle for silica and 0. 11 nm/cycle for titania. The thicknesses of the passivation layers can be precisely controlled by changing the number of ALD cycle. In coking experiments, very thin films of silica or titania only show modest anti-coking performances and thicker coatings can effectively enhance the run lengths of the micro channel reactors. Generally, ALD titania coatings perform better than silica coatings. The best anti-coking performance is obtained with a 1000-cycles ALD titania passivation layer, which can extend the lifetime of the reaction system by a factor of 4 to 5.
What problem does this paper attempt to address?