1178 J, 527 nm near diffraction limited laser based on a complete closed-loop adaptive optics controlled off-axis multi-pass amplification laser system
Deen Wang,Xin Zhang,Wanjun Dai,Ying Yang,Xuewei Deng,Lin Chen,Xudong Xie,Dongxia Hu,Feng Jing,Zeping Yang,Qiang Yuan,Xiaofeng Wei,Qihua Zhu,Wanguo Zheng,Xiaomin Zhang,Lei Huang
DOI: https://doi.org/10.1017/hpl.2021.3
IF: 4.8
2021-01-01
High Power Laser Science and Engineering
Abstract:Abstract A 1178 J near diffraction limited 527 nm laser is realized in a complete closed-loop adaptive optics (AO) controlled off-axis multi-pass amplification laser system. Generated from a fiber laser and amplified by the pre-amplifier and the main amplifier, a 1053 nm laser beam with the energy of 1900 J is obtained and converted into a 527 nm laser beam by a KDP crystal with 62% conversion efficiency, 1178 J and beam quality of 7.93 times the diffraction limit (DL). By using a complete closed-loop AO configuration, the static and dynamic wavefront distortions of the laser system are measured and compensated. After correction, the diameter of the circle enclosing 80% energy is improved remarkably from 7.93DL to 1.29DL. The focal spot is highly concentrated and the 1178 J, 527 nm near diffraction limited laser is achieved.
optics