Electrogenerated chemical polishing method

Zhou Ping,Kang Renke,Shan Kun,Shi Kang,Cai Jiqing,Dong Zhigang,Guo Dongming
2014-01-01
Abstract:The invention provides an electrogenerated chemical polishing method which comprises the following steps: preparing a working solution which contains an electroactive mediator, a pH regulating agent, a viscosity regulating agent and an inhibiting agent; parallelly and oppositely arranging the working surface of a working electrode and the surface of a workpiece, wherein the working surface of the working electrode has smoothness less than 1 micrometer; and immersing the working surface of the working electrode and the surface of the workpiece into the working solution, and regulating the spacing between the working surface of the working electrode and the surface of the workpiece to 0.05-20 micrometers through a micro-nano composite feeding mechanism. According to the method, a power supply is started to electrify the working electrode and an auxiliary electrode, the electroactive mediator near the working surface of the working electrode generates an etching agent through electrochemical reaction, and a local high point positioned on the surface of the workpiece is selectively etched in such a way that the etching agent is dispersed to the surface of the workpiece and generates diffusion controlled etching reaction, so that the unstressed polishing on the surface of the workpiece is realized.
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