Dual‐channel Type Tunable Field‐effect Transistors Based on Vertical Bilayer WS2(1 − X)se2x/sns2 Heterostructures

Biyuan Zheng,Dong Li,Chenguang Zhu,Jianyue Lan,Xingxia Sun,Weihao Zheng,Huawei Liu,Xuehong Zhang,Xiaoli Zhu,Yexin Feng,Tao Xu,Litao Sun,Gengzhao Xu,Xiao Wang,Chao Ma,Anlian Pan
DOI: https://doi.org/10.1002/inf2.12071
2019-01-01
InfoMat
Abstract:Layered semiconductor heterostructures are essential elements in modern electronic and optoelectronic devices. Dynamically engineering the composition of these heterostructures may enable the flexible design of the properties of heterostructure-based electronics and optoelectronics as well as their optimization. Here, we report for the first time a two-step chemical vapor deposition approach for a series of WS2(1-x)Se2x/SnS2 vertical heterostructures with high-quality and large areas. The steady-state photoluminescence results exhibit an obvious composition-related quenching ratio, revealing a strong coherence between the band offset and the charge transfer efficiency at the junction interface. Based on the achieved heterostructures, dual-channel back-gate field-effect transistors were successfully designed and exhibited typical composition-dependent transport behaviors, and pure n-type unipolar transistors to ambipolar transistors were realized in such systems. The direct vapor growth of these novel vertical WS2(1-x)Se2x/SnS2 heterostructures could offer an interesting system for probing new physical properties and provide a series of layered heterostructures for high-quality devices. image
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