Patterning etching method of transparent conducting electrode and patterning transparent conducting electrode

Zhu Rui,Wu Jiang,Hu Qin,Que Xinglu,Gong Qihuang
2015-01-01
Abstract:The invention discloses patterning etching method of a transparent conducting electrode and a patterning transparent conducting electrode. The method comprises the steps that an electrode to be patterned is manufactured; a patterning protecting layer is prepared on the electrode; the electrode is placed in etching liquid or gas for etching; and the electrode is placed in washing liquid, and etching products and the protecting layer are washed off. The method is used for carrying out latticed patterning on metal nanowires, and the latticed patterning transparent conducting electrode is manufactured. Metal or a metal nanowire film is subjected to quick, low-cost, safe and low-toxic chemical etching through gas or low-concentration etching liquid, complete etching can be achieved, shadowless etching can be achieved, safety and low-toxic performance are achieved, etching speed is high, and effect is obvious in practical application. A prepared latticed patterning transparent conducting electrode comprehensive nanowire and a nanometer lattice transparent electrode have the advantages that under the premise that conductivity loss is very small, transparency is greatly improved, and performance is good.
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