Controllable Etching-Induced Contact Enhancement for High-Performance Carbon Nanotube Thin-Film Transistors

Zhengxia Lv,Dan Liu,Xiaoqin Yu,Qianjin Lv,Bing Gao,Hehua Jin,Song Qiu,Chuanling Men,Qijun Song,Qingwen Li
DOI: https://doi.org/10.1039/c9ra01052a
IF: 4.036
2019-01-01
RSC Advances
Abstract:Semiconducting single-walled carbon nanotubes (s-SWNTs) show great promises in advanced electronics. However, contact resistance between the nanotubes and metal electrode has long been a bottleneck to the development of s-SWNTs in high-performance electronic devices. Here we demonstrate a simple and controllable strategy for enhancing the electrode contact and therefore the performance of s-SWNT thin film transistors by plasma etching treatment, which effectively removes the polymer residues, including the photoresist and the conjugated molecules, adsorbed on the surface of s-SWNTs. As a result, the contact resistance is reduced by 3 times and the carrier mobility rises by up to 70%. Our method is compatible with current silicon semiconductor processing technology, making it a viable effective approach to large-scale application of s-SWNTs in the electronics industry.
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