Abstract:Silicon nitride (Si3N4) is an ideal candidate for the development of low-loss photonic integrated circuits. However, efficient light coupling between standard optical fibers and Si3N4 chips remains a significant challenge. For vertical grating couplers, the lower index contrast yields a weak grating strength, which translates to long diffractive structures, limiting the coupling performance. In response to the rise of hybrid photonic platforms, the adoption of multi-layer grating arrangements has emerged as a promising strategy to enhance the performance of Si3N4 couplers. In this work, we present the design of high-efficiency surface grating couplers for the Si3N4 platform with an amorphous silicon (α-Si) overlay. The surface grating, fully formed in an α-Si waveguide layer, utilizes subwavelength grating (SWG)-engineered metamaterials, enabling simple realization through single-step patterning. This not only provides an extra degree of freedom for controlling the fiber–chip coupling but also facilitates portability to existing foundry fabrication processes. Using rigorous three-dimensional (3D) finite-difference time-domain (FDTD) simulations, a metamaterial-engineered grating coupler is designed with a coupling efficiency of −1.7 dB at an operating wavelength of 1.31 μm, with a 1 dB bandwidth of 31 nm. Our proposed design presents a novel approach to developing high-efficiency fiber–chip interfaces for the silicon nitride integration platform for a wide range of applications, including datacom and quantum photonics.

Tri-layer Gradient and Polarization-Selective Vertical Couplers for Interlayer Transition.

Interlayer Slope Waveguide Coupler for Multilayer Chalcogenide Photonics

High-efficiency Dual-Layer Grating Coupler for Vertical Fiber-Chip Coupling in Two Polarizations

SiNx-Si Interlayer Coupler Using a Gradient Index Metamaterial

Low-loss 3-dimensional waveguide crossing with a parabolic taper interlayer coupler based on a SiN-SiN-Si three-layer platform

Multi-layer Silicon Nitride-on-silicon Polarization-Independent Grating Couplers.

High-efficiency Grating Coupler Based on Fast Directional Optimization and Robust Layout Strategy in 130 Nm CMOS Process.

Tri-layer Silicon Nitride-on-silicon Photonic Platform for Ultra-Low-loss Crossings and Interlayer Transitions

High-Performance Vertical Interlayer Coupler for Multilayer Silicon Nitride-on-Silicon Photonic Platform

Low-loss Grating Coupler with a Gradient Index-Matching Subwavelength Structure

High-efficient Four-Mode Si-SiN Interlayer Coupler with Dual Polarizations

High-efficiency Wideband SiNx-on-SOI Grating Coupler with Low Fabrication Complexity.

Design of a Completely Vertical, Polarization-Independent Two-Dimensional Grating Coupler with High Coupling Efficiency

SiN-SOI Multilayer Platform for Prospective Applications at 2 Μm

Ultra-compact arrayed waveguide grating triplexer based on silicon-on-insulator platform

An Eight-Channel 400 GHz-Spacing Etched Diffraction Grating Multi/Demultiplexer on a Nanophotonic Silicon-on-Insulator Platform

High-Efficiency Metamaterial-Engineered Grating Couplers for Silicon Nitride Photonics

High-efficiency Dual-Level Heterogenous Grating Coupler on CMOS-compatible Silicon-Lithium Niobate Platform

Experimental Demonstration of Efficient and Polarization-Diversity Fiber-Chip Coupling by 2D Grating Couplers with 193-nm DUV Lithography

Ultra-low-loss optical interconnect enabled by topological unidirectional guided resonance

Multi-stacked Silicon Wire Waveguides and Couplers Toward 3D Optical Interconnects