Abstract:Run-to-Run (R2R) control has been widely used in semiconductor manufacturing to compensate for process disturbance and to improve quality. The traditional R2R controller only takes the process output in a previous run as its input and generates an optimal recipe for the next run. In a multistage semiconductor manufacturing process, variations in upstream stations are propagated to downstream stations. However, the information from upstream stations is not considered by existing controllers. In addition, most R2R processes have a limited capacity; the products must be processed in batches. Therefore, if the incoming materials could be grouped with small within-batch variations and large batch-to-batch variations and the recipes are customized for each batch to drive all batch averages toward the same target value, the output variation could be reduced and quality improved. A batch Exponentially Weighted Moving Average (EWMA) controller is proposed in this article. It employs a modified K-means algorithm to group the incoming materials into batches with a fixed and equal size while minimizing the within-batch variation. The controller then generates the control settings by taking both the batch information and the feedback quality information into account. Simulation studies show that the proposed controller could significantly reduce output variation and improve quality.

Comments on “extensions and Performance/Robustness Tradeoffs of the EWMA Run-to-Run Controller by Using the Internal Model Control Structure”

An Analysis and Performance Assessment of Double Ewma Control Systems

Performance analysis and comparison between two forms of double EWMA controllers in industrial process

Model Quality Evaluation in Semiconductor Manufacturing Process with Ewma Run-To-Run Control

Performance Analysis of Single EWMA Controller Subject to Metrology Delay under Dynamic Models

Takagi–Sugeno Model Based Analysis of EWMA RtR Control of Batch Processes with Stochastic Metrology Delay and Mixed Products

Performance Analysis of Double EWMA Controller under Dynamic Models with Drift

Stability analysis of semiconductor manufacturing process with EWMA run-to-run controllers

A Feed-Forward/Feedback Run-to-Run Control of a Mixed Product Process: Simulation and Experimental Studies

Data-mechanism-driven Product Performance Optimization with Multiple Parameters under Uncertainties in Manufacturing Automation Systems

On Variable Weight Ewma Based Run-to-Run Control in Mixed Product Process

Research development of R2R control methods for semiconductor manufacturing process

A Batch-Based Run-To-Run Process Control Scheme for Semiconductor Manufacturing

EWMA for Run-to-run Control with Time-Varying Discount Factor in High-Mix Process

The Optimal Drift-Compensatory and Fault Tolerant Approach for Mixed-Product Run-to-run Control

Structure Restricted (PID) Controller Performance Assessment for Multi-Stage Batch Processes with Tracking and Regulatory Requirements

Stability and Control Performance Analysis of Double EWMA Controller with Metrology Delay

A Run-To-Run Control Algorithm Based on Timely and Delayed Mixed-Resolution Information

Machinery-oriented Capacity Control for Complex Industrial Manufacturing Processes

A RLS Run-to-run Control Approach for Semiconductor Manufacturing Process

A General Harmonic Rule Controller for Run-to-Run Process Control