Abstract:Statistical process control (SPC) methods are useful for improving or maintaining a manufacturing or service process in a stable and satisfactory state. Nowadays, in many industrial applications, it is necessary to simultaneously monitor more than two related quality variables of a process. Multivariate control charts are thus becoming an important research area. Using separate control charts to monitor related quality variables independently is very unreasonable and misleading. The problem of monitoring multivariate statistical process (MSPC) for several related quality variables is of current interest. So far in the literature, a few papers have discussed monitoring process dispersion for cases in which the process has a multivariate normal or non‐normal distribution. A new EWMA dispersion control chart is proposed to monitor the process covariance matrix. Moreover, the proposed new EWMA dispersion control chart is independent of the out‐of‐control process mean vector. It overcomes the problem in many existing covariance matrix control charts of assuming that there are no shifts in the process mean vector which, depending on the existence of shifts in mean, can lead to an increased false alarm rate. The derivation of the new EWMA dispersion control chart is illustrated and its out‐of‐control detection performance investigated. The proposed new EWMA dispersion control chart performs better than the existing control charts for detecting out‐of‐control process variances whether the covariances change or not. An example involving semi‐conductor data is adopted to demonstrate the application of the proposed new EWMA dispersion control chart.

On Variable Weight Ewma Based Run-to-Run Control in Mixed Product Process

A Batch-Based Run-To-Run Process Control Scheme for Semiconductor Manufacturing

An Integrated Design for Batch Process Using Optimal Average Profit Control with Unfixed Terminal Time

Stability analysis of semiconductor manufacturing process with EWMA run-to-run controllers

The Negative Binomial Exponentially Weighted Moving Average Chart with Estimated Control Limits

Coordination and Control of Batch-Based Multistage Processes

Development of Decay Based PLS Model and Its Economic Run-to-Run Control for Semiconductor Processes

A Run-To-Run Control Algorithm Based on Timely and Delayed Mixed-Resolution Information

A Robust Statistical Batch Process Monitoring Framework And Its Application

Run-to-Run Process Adjustment Using Categorical Observations

Process Adjustment with an Asymmetric Quality Loss Function

A Run-to-run Controller for Product Surface Quality Improvement

A General Harmonic Rule Controller for Run-to-Run Process Control

Run Length Distributions Analysis and Case Study for MEWMA

Interval Weight State Update Approach with Deep Reinforcement Learning for Dynamic Load Change Tasks in Air Separation Processes

Structure Restricted (PID) Controller Performance Assessment for Multi-Stage Batch Processes with Tracking and Regulatory Requirements

A new phase II EWMA dispersion control chart

Deep reinforcement learning-assisted extended state observer for run-to-run control in the semiconductor manufacturing process

Run-to-run iterative optimization control of batch

Online Parameter Estimation and Run-To-Run Process Adjustment Using Categorical Observations

Robust Iterative Learning Control for Multi-Phase Batch Processes: an Average Dwell-Time Method with 2D Convergence Indexes