First-Principles Calculation of Electronic Structure and Optical Properties of Monolayer MoS1.89X0.11

Fan Menghui,Cai Xunming,Cen Weifu,Luo Zuifen,Xie Quan
DOI: https://doi.org/10.3788/lop52.051602
2015-01-01
Laser & Optoelectronics Progress
Abstract:The electric structure and optical properties of monolayer MoS1.89X0.11 have been calculated by the firstprinciple pseudopotential method based on density functional theory (DFT). The results show that monolayer MoS1.89X0.11 (X=P, Si, Al) turn to a p-type semiconductor and the conduction band bottom is moved to the direction of low energy. The band gap of monolayer MoS2 of P-doped and Si-doped is turned from K-point to Γ point in the BZ. The band gap of monolayer MoS2 of Al-doped turned to an indirect semiconductor at K Γ point. Through analyzing the density of states and decentralization of grid, the optical properties of monolayer MoS2 is changed for the variation of carrier concentration and the hybrid orbitals of impurity atoms with S3p and Mo4d, especially Aldoped is the most effect that the static dielectric constant and refractive index is increased and the energy loss function is reduced.
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