Abstract:Mask Projection micro-Stereolithography (MPμSL) is an additive manufacturing technique capable of producing solid parts with micron-scale resolution from a vat of photocurable liquid polymer resin. Although the physical mechanism remains the same, the process differs from traditional laser-galvanometer based stereolithography (SL) in its use of a dynamic mask UV projector, or digital light processor (DLP), which cures each location within each 3D layer at the same time. One area where MPµSL has garnered considerable attention is in the field of microfluidics and Lab-on-a-Chip, where complex multistep microfabrication techniques adopted from the semiconductor industry are still widely used, and where MPµSL offers the ability to fabricate completely encapsulated fluidic channels in a single step and at low cost [1–3]. However, a significant obstacle exists in the prevention of channel blockage due to overcuring of the polymer resin [4, 5]. Overcuring can be attributed to the so-called ‘back side effect’ [2] which occurs during the build process as light from successive layers penetrates into the resin to a depth greater than the layer thickness. This effect is most prevalent in channels or features oriented horizontally (in a parallel plane to that of the build platform). Currently there are two main approaches in controlling the cure depth; 1. the chemical approach, which involves doping the resin material with a chemical light absorber [6–8]; and 2. by improving the system's hardware and optical elements to improve the homogeneity of the light dosage and control the cure depth [9]. Here we investigate a third approach through modification of the 3D CAD file prior to printing to mitigate for UV light leakage from successive build layers. Although used here in conjunction with the MPμSL technique, this approach can be applied to a range of SL techniques to improve printer resolution and enable production of internal features with higher dimensional accuracy.

Development Of A Compact And Cost Effective Msl System Based On A Compliant Nanomanipulator

Robust Tracking of a Cost-Effective Micro-Stereolithography System Based on a Compliant Nanomanipulator

A Robust Tracking of a Compliant Nanomanipulator-based Micro Stereo Lithography System

A Compliant Nano-manipulator-based Scanning Probe Lithography System

Projection Micro-Stereolithography Using Digital Micro-Mirror Dynamic Mask

Cost-Effective Laboratory Matrix Projection Micro-Lithography System

Novel Stereolithography System for Small Size Objects

A compact low-cost low-maintenance open architecture mask aligner for fabrication of multilayer microfluidics devices

A Low-Cost Fabrication System for Manufacturing Soft-Lithography Microfluidic Master Molds

Hybrid-Light-Source Stereolithography for Fabricating Macro-Objects With Micro-Textures

Development of a High–resolution Rapid Prototyping System for Small Size Objects

Liquid Microlens Compound Structure for Enhanced Sub-Micron Resolution Imaging and Accelerated Reconfigurable Deformation Manipulation

Fabrication of High Precision Grating Patterns with a Compliant Nanomanipulator-Based Femtosecond Laser Direct Writing System

Cross-Coupled Repetitive Control of a Compliant Nanomanipulator for Micro-Stereolithography.

Mitigation and control of the overcuring effect in mask projection micro-stereolithography

Ultralarge-Area Stitchless Scanning Probe Lithography and in Situ Characterization System Using a Compliant Nanomanipulator

Microscope Projection Photolithography Based on Liquid Crystal Microdisplay

A Large Range Flexure-Based Servo System Supporting Precision Additive Manufacturing

Study on Feasibility of Integration of Micro Stereo Lithography and LIGA

Precise Fabrication of Large-Area Microstructures by Digital Oblique Scanning Lithography Strategy and Stage Self-Calibration Technique

Fast Mask Image Projection-Based Micro-Stereolithography Process for Complex Geometry