Long Wavelength InAs0.05Sb0.95 Photodiodes Grown by Melt Epitaxy

Y. Z. Gao,X. Y. Gong,T. Makino,H. Kan,T. Koyama,Y. Hayakawa
2019-01-01
Optoelectronics and advanced materials rapid communications
Abstract:InAs0.05Sb0.95 thick epilayers were grown on InAs substrates by melt epitaxy (ME). Long wavelength photodiodes made from the thick epilayers were obtained operating at 77 K. Homojunctions were formed on n-InAs0.05Sb0.95 wafers by zinc diffusion. Current-voltage characteristics of p-n junctions were measured at 50 K, 77 K and 100 K respectively. The dark current density is 2.4 X 10(-4) A/cm(2) under -10 mV bias at 77 K. Spectral photoresponse of the devices showed that 50% cutoff wavelength is 8 mu m, and 20% cutoff wavelength is 9 mu m. It indicates promising prospect for infrared (IR) detection.
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