Schottky Barrier Diode Fabricated on Oxygen-Terminated Diamond Using a Selective Growth Approach

Dan Zhao,Zhangcheng Liu,Juan Wang,Wenyang Yi,Ruozheng Wang,Wei Wang,Kaiyue Wang,Hong-Xing Wang
DOI: https://doi.org/10.1016/j.diamond.2019.107529
IF: 3.806
2019-01-01
Diamond and Related Materials
Abstract:A Schottky barrier diode (SBD) fabricated on oxygen-terminated diamond using a selective growth approach is demonstrated. Patterned tungsten (W) film was used as the mask, and ohmic contact was formed between W and diamond during the selective growth process. After growth, the selective epitaxial diamond surface was treated by UV-ozone to achieve oxygen termination. Then, Zr/Ni/Au Schottky electrode was patterned on the selective grown diamond surface. The I-V characteristics indicate that the SBD is p-type, and a rectification ratio of more than 5 orders of magnitude at +/- 20 V at room temperature is observed. The acceptor might be introduced by W incorporated into diamond during selective growth process, and its concentration was determined to be 2.7 x 10(1)(4) cm(-3) from C-2-V curve. The reverse breakdown voltage of the SBD is 1316 V, corresponding to a breakdown electrical field of 6.3 MV/cm. The reverse current-voltage characteristics show that the UV ozone treatment can favorably suppress reverse leakage current.
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