Nonlinear Phase Error Analysis of Equivalent Thickness in a White-Light Spectral Interferometer

Tong Guo,Qianwen Weng,Bei Luo,Jinping Chen,Xing Fu,Xiaotang Hu
DOI: https://doi.org/10.1016/j.npe.2019.07.003
2019-01-01
Nanotechnology and Precision Engineering
Abstract:A white light spectral interferometry based on a Linnik type system was established to accurately measure the thin film thickness through transparent medium. In practical work, the equivalent thickness of a beam splitter and the mismatch of the objective lens introduce nonlinear phase errors. Adding a transparent medium also increases the equivalent thickness. The simulation results show that the equivalent thickness has a significant effect on thin film thickness measurements. Therefore, it is necessary to perform wavelength correction to provide a constant equivalent thickness for beam splitters. In the experiments, some pieces of cover glasses as the transparent medium were added to the measured beam and then a standard thin film thickness of 1052.2±0.9 nm was tested through the transparent medium. The results demonstrate that our system has a nanometer-level accuracy for thin film thickness measurement through transparent medium with optical path compensation.
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