Abstract:Copper (Cu) is an important interconnect metal material in the semiconductor field. While removing excess copper in the chemical mechanical polishing process, it is necessary to add corrosion inhibitors to the slurry to protect copper from excessive corrosion. Numerous studies have shown that the heteroatoms and functional groups of corrosion inhibitors are crucial factors affecting their corrosion inhibition ability. The corrosion inhibition performance of benzimidazole (BI) and its two derivatives, 5-methyl benzimidazole (MBI) and 5-methyl benzotriazole (MBTA), on copper in glycine + N-methylglycine solution at pH 9 was studied, and their structure-activity relationship was revealed. Electrochemical measurements and adsorption isotherm fittings show that the three corrosion inhibitors cover the copper surface mainly through the chemisorption to prevent the anodic reaction of copper. The corrosion inhibition efficiencies of BI, MBI, and MBTA were 97.22%, 98.00% and 98.73% at the concentration of 8 mM, respectively, reaching their maximum values. The contact angle testing reveals that MBI and MBTA containing methyl groups are relatively more hydrophobic. X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and scanning electron microscope (SEM) results confirm that the three corrosion inhibitors were successfully adsorbed on the copper surface and formed a dense passivation film to protect the copper from corrosive solutions. In addition, a multi-module collaboration with density functional theory (DFT) and molecular dynamics (MD), further demonstrates that BI, MBI, and MBTA are all adsorbed on the copper layer in a mixed way, and MBTA has the strongest binding capacity to copper. The introduction of the methyl and N atom increased the adsorption area and attachment sites between the corrosion inhibitor and copper, which coincides with the experimental results.

Chloride-Assisted Corrosion of Copper and Protection by Benzotriazole

Studies of Benzotriazole on and into the Copper Electrodeposited Layer by Cyclic Voltammetry, Time-of-Flight Secondary-Ion Mass Spectrometry, Atomic Force Microscopy, and Surface Enhanced Raman Spectroscopy

Adsorption and protective behavior of BTAH on the initial atmospheric corrosion process of copper under thin film of chloride solutions

5-Methyl-1h-benzotriazole As Potential Corrosion Inhibitor for Electrochemical-Mechanical Planarization of Copper

Corrosion Inhibition of Copper in Tetra‐n‐butylammonium Bromide Aqueous Solution by Benzotriazole

Influence of Ph, Immersion Time, and Benzotriazole Concentration on Copper Corrosion in Citric Acid Based Slurries

Theoretical and electrochemical analysis on inhibition effects of benzotriazole derivatives (un- and methyl) on copper surface

Synergistic inhibition of azoles compounds on chloride-induced atmospheric corrosion of copper: Experimental and theoretical characterization

Corrosion Inhibition of Copper–phosphorus Brazing Alloys in Tetra‐n‐butylammonium Bromide Aerated Aqueous Solution by Benzotriazole

Experimental and Computational Insights into the Effects of -NH2 and -Cl Functional Groups on the Copper Corrosion Inhibition by Benzotriazole

Molecular dynamics analysis of adsorption process of anti-copper-corrosion additives to the copper surface

The Unexpected Role of Benzotriazole in Mitigating Magnesium Alloy Corrosion: A Nucleating Agent for Crystalline Nanostructured Magnesium Hydroxide Film

Chemisorption of A Compact Polymeric Coating on Copper Surfaces from A Benzotriazole Solution

Corrosion inhibition effect of benzimidazole and two derivatives on copper in alkaline environments: experimental and theoretical analyses

SERS, XPS, and Electroanalytical Studies of the Chemisorption of Benzotriazole on a Freshly Etched Surface and an Oxidized Surface of Copper

Synergistic Inhibition of Zinc Corrosion by Benzotriazole in Combination with Sodium Phosphate

Corrosion Inhibition of Zinc in Tetra-N-Butylammonium Bromide Aerated Aqueous Solution by Benzotriazole and Na3po4

Adsorption Dynamics Of Benzotriazole On Copper In Chloride Solution

Surface Protection Of Copper By Self-Assembly Of Novel Poly(5-Methylenebenzotriazol-N-Yl)

Inhibition Mechanism of Benzotriazole in Copper Chemical Mechanical Planarization

Composite protective effect of benzotriazole and 2-mercaptobenzothiazole on electroplated copper coating