Photo-induced High Modulation Depth Terahertz Modulator Based on VOx–Si–VOxhybrid Structure

Fangrong Hu,Hong Wang,Tong Li,Xiaowen Zhang,Weiming Wang,Mingzhu Jiang,Wentao Zhang,Dongxia Li,Shan Yin,Jiaguang Han,Xianming Xiong,Ying Chen,Yuan Zhou
DOI: https://doi.org/10.1088/1361-6463/ab046f
2019-01-01
Abstract:We demonstrate a photo-induced high modulation depth terahertz (THz) modulator based on a VOx/Si/VOx hybrid structure. The thickness of the embedded high resistance silicon substrate is 510 µm and two layers of VOx films are 100 nm, respectively. Compared with other THz modulators based on the phase transition of vanadium oxide which were fabricated by complex chemical vapor deposition and sputtering processes, the VOx film in this device is fabricated using a simple spin coating process of VOx solution. The sample is characterized using a THz time-domain-spectroscopy system. In the test experiment, the insulator–metal-transition of the VOx is induced by two oblique incident pump lasers with a central wavelength of 650 nm from two sides. The experimental results show that it can be optically modulated in a wide frequency range from 0.2 to 2.0 THz, and the maximum modulation depth of 93% is realized when the optical power is 120 mW. Film theory and Drude theory are introduced to interpret the mechanism of modulation. This modulator has broadband, a simple fabrication process and very low optical power, which are important for broadband THz communication and all-optical THz systems.
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