Abstract:An imaging polarimeter is developed for measuring polarization properties of hyper number aperture (NA) lithography tools, which can be represented by stokes entrance-pupil, stokes exit-pupil and mueller pupil of projection optics. This imaging polarimeter is optimized from the following three aspects. Firstly, a new method is proposed to measure stokes entrance-pupil of projection optics. It employs a rotating-waveplate and a fixed-polarizer as polarization state analyzer (PSA). Compared to the method proposed by Nomura, the number of measurements is reduced from 16 to 4 times. Additionally, the large incident angle in the mask plane leads to unacceptable retardation error of conventional waveplate, which terribly influent the measurement accuracy of the imaging polarimeter. Therefore, the imaging polarimeter can be optimized by employing a wide-view-angle (WVA) waveplate composed of quartz and sapphire plates. An example of 632.8nm WVA λ/4 waveplate is designed based on least square algorithm, which is firstly introduced to calculate the thicknesses of four crystal plates. Simulation result shows that the retardation error is less than 0.3° for incident angle within 20°. Thirdly, the WVA waveplate is successfully fabricated and its retardation is calibrated by senarmont method. Measurement data is contributed to eliminate the uncertainty of retardation and thus improves the performance of the imaging polarimeter. Because of the lack of lithography equipment, the imaging polarimeter is preliminarily tested in the visible optical system with a He-Ne laser. Stokes entrance-pupil, stokes exit-pupil and mueller pupil of projection optics are all measured with quite enough measurement repeatability.

Polarization aberration analysis in lithographic tools

Polarization Aberration Measurement of Lithographic Tools

Reduction of Coating Induced Polarization Aberrations by Controlling the Polarization State Variation

General Analytical Expressions for the Impact of Polarization Aberration on Lithographic Imaging under Linearly Polarized Illumination.

Polarization analysis of projection display system

Measuring the Polarization Aberration of Hyper-Na Lens from the Vector Aerial Image

Three-dimensional Polarization Aberration in Hyper-Numerical Aperture Lithography Optics

Polarization Aberration Control for Hyper-Na Lithographic Projection Optics at Design Stage

Polarization Aberration In-Situ Measurement in Lithography Tools

High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized Illuminations

Analysis of coating-induced polarization aberrations based on Jones matrix

A Technique for Extracting and Analyzing the Polarization Aberration of Hyper-Numerical Aperture Image Optics

Polarization Aberration Compensation Method by Adjusting Illumination Partial Coherent Factors in Immersion Lithography

Optimal Polarization Modulation for Orthogonal Two-Axis Lloyd’s Mirror Interference Lithography

Analysis of Coating-Induced Polarization Aberrations by Jones Matrix

Polarization Aberration Measurement Method Based on Principal Component Analysis of Differential Aerial Images

Effect of Coating-Induced Polarization Aberrations on the Focusing Properties in High Numerical Aperture Optical System

Optimized Imaging Polarimeter for Measuring Polarization Properties of Hyper Number Aperture Lithography Tools

Rigorous Imaging-Based Measurement Method of Polarization Aberration in Hyper-Numerical Aperture Projection Optics.

Polarization Aberrations in High-Numerical-Aperture Lens Systems and Their Effects on Vectorial-Information Sensing

A Method for Compensating the Polarization Aberration of Projection Optics in Immersion Lithography