A Novel Double-RESURF SOI Lateral TIGBT with Self-Biased Nmos for Improved V-CE(sat)-E-off Tradeoff Relationship

Huan Hu,Haimeng Huang,Xing Bi Chen
DOI: https://doi.org/10.1109/ted.2018.2878474
IF: 3.1
2019-01-01
IEEE Transactions on Electron Devices
Abstract:A novel double-reduced surface field (RESURF) silicon-on-insulator(SOI) lateral trench insulated-gate bipolar transistor (LTIGBT) with self-biased nMOS is proposed and investigated by simulation. During the turn-on transient, the self-biased nMOS is turned-off, and the p-top region is floating, and therefore the conductivity modulation in the drift region on the emitter side can be enhanced to achieve a low on-state voltage (V-CE(sat)). During the turn-off transient, the self-biased nMOS is turned on, and the p-top region is connected to the emitter, which effectively reduces its turn-off loss (E-OFF). As a result, the proposed LTIGBT realizes superior V-CE(sat)-E-OFF tradeoff relationship than both the conventional SOI trench-gate lateral insulated-gate bipolar transistor (LIGBT) (LTIGBT-A) and the double-RESURF SOI trench-gate LIGBT (LTIGBT-B). Simulation results reveal that, with the identical EOFF of 0.25 mJ/cm(2), V-CE(sat) of the proposed LTIGBT is 1.08 V, which is 11.4% and 32.5% lower than those of LTIGBT-A and LTIGBT-B, respectively; with the identical V-CE(sat) of 1.1 V, EOFF of the proposed one is 0.19 mJ/cm(2), which is 70% and 89% lower than the other two, respectively. Furthermore, the proposed device exhibits a lower saturation current.
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