CH3NH3PbI3 Single Crystal-Based Ambipolar Field-Effect Transistor with Ta2O5 As the Top Gate Dielectric

Lu Qian-Rui,Li Jing,Lian Zhi-Peng,Zhao Hao-Yan,Dong Gui-Fang,Li Qiang,Wang Li-Duo,Yan Qing-Feng
DOI: https://doi.org/10.3866/pku.whxb201610142
2017-01-01
Acta Physico-Chimica Sinica
Abstract:Organic-inorganic hybrid perovskite methylammonium lead iodide (CH3NH3PbI3) generally tends to show n-type semiconductor properties. In this work, a field-effect transistor (FET) device based on a CH3NH3PbI3 single crystal with tantalum pentoxide (Ta2O5) as the top gate dielectric was fabricated. The p-type field-effect transport properties of the device were observed in the dark. The hole mobility of the device extracted from transfer characteristics in the dark was 8.7 x 10(-5) cm(2).V-1.s(-1), which is one order of magnitude higher than that of polycrystalline FETs with SiO2 as the bottom gate dielectric. In addition, the effect of light illumination on the CH3NH3PbI3 single-crystal FET was studied. Light illumination strongly influenced the field effect of the device because of the intense photoelectric response of the CH3NH3PbI3 single crystal. Different from a CH3NH3PbI3 polycrystalline FET with a bottom gate dielectric, even with the top gate dielectric shielding, light illumination of 5.00 mW.cm(-2) caused the hole current to increase by one order of magnitude compared with that in the dark V-GS (gate-source voltage) = V-DS (drain-source voltage) = 20 V) and the photoresponsivity reached 2.5 A.W-1. The introduction of Ta2O5 as the top gate dielectric selectively enhanced hole transport in the single-crystal FET, indicating that in the absence of external factors, by appropriate device design, CH3NH3PbI3 also has potential for use in ambipolar transistors.
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