Silane Activation by Laser-Ablated Be Atoms: Formation of HBeSiH 3 and HBe(μ-H) 3 Si Molecules

Jie Zhao,Wenjie Yu,Bing Xu,Tengfei Huang,Xuefeng Wang
DOI: https://doi.org/10.1016/j.cplett.2017.01.023
IF: 2.719
2017-01-01
Chemical Physics Letters
Abstract:Laser-ablated beryllium atoms have been reacted with silane molecules during condensation in excess neon and argon at 4 K Absorptions due to HBeSiH3 and HBe(mu-H)(3)Si were observed and identified on the basis of isotopic IR spectroscopy, deuterium substitution with SiD4, and quantum chemical frequency calculations. The observed results show excited Be atom((1)p(1):2s(1)2p(1)) can insert into Si-H bond spontaneously and the insertion product rearranges to HBe(mu-H)3Si upon photolysis. The electron localization function (ELF) analysis suggests that 3c-2e hydrogen bridge bond (Be-H-Si) was formed by the donation of electrons for Si-H sigma bond to the empty p orbital of Be atom for HBe(mu-H)(3)Si molecule, which shows much difference from C-H bond complexes.(C) 2017 Elsevier B.V. All rights reserved.
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