APPLICATION OF XPS TO STUDYING DISPERSION AND SURFACE STATE FOR MoO 3 SUPPORTED ON THE SURFACE OF TiO 2 , Γ-Al 2 O 3 AND SiO 2

桂琳琳,刘英骏,郭沁林,黄惠忠,唐有祺
DOI: https://doi.org/10.1360/yb1985-28-12-1233
1985-01-01
Science China Chemistry
Abstract:> In MoO 3 /TiO 2 , MoO 3 /γ-Al+2O 3 and MoO 3 /SiO 2 systems, the relationships between I Mo3d /I Ti2p , I Mo3d /I Al2p , I Mo3d /I Si2p and added amount of MoO 3 (g/g carrier) were studied by XPS. Experiments showed that all the curves obtained had a turning point each, corresponding to the monolayer dispersion threshold by XRD in our previous paper. This means that both methods are successful for studying the maximum dispersion amount and surface state of supported metal oxides (or salts) catalysts. Although the two methods are not from the same principle, they are verifiable and complementary to cach other in studying dispersion problems.
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