Reliable Nonvolatile Memory Black Phosphorus Ferroelectric Field Effect Transistors with Van Der Waals Buffer.

Shili Yan,Hai Huang,Zhijian Xie,Guojun Ye,Xiao-Xi Li,Takashi Taniguchi,Kenji Watanabe,Zheng Han,Xianhui Chen,Jianlu Wang,Jian-Hao Chen
DOI: https://doi.org/10.1021/acsami.9b15457
IF: 9.5
2019-01-01
ACS Applied Materials & Interfaces
Abstract:Two-dimensional material-based ferroelectric field-effect transistors (2D-FeFETs) hold great promise in information storage and processing. However, an often-observed and hard-to-control anti-hysteresis response of 2D-FeFETs, for example, hysteretic switching of the resistance states of the devices opposite to that of the actual polarization of the ferroelectric dielectric, represents a major issue in the industrial applications of such devices. Here, we demonstrate a van der Waals buffer technique that eliminates anti-hysteresis in black phosphorus (BP) 2D-FeFETs and restores their intrinsic hysteretic behavior. Our modified BP 2D-FeFETs showed outstanding performance including high room-temperature carrier mobility, robust bistable states with fast response to a gate, a large on/off ratio at zero gate voltage, a large and considerably more stable memory window, and a long retention time. During repeated gate operation, the memory window of the buffered device is ∼7000 times more stable than the unbuffered device. Such a method could be crucial in future information technological applications that utilize the intrinsic properties of 2D-FeFETs.
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