Nanoindentation studies of Cu–W alloy films prepared by magnetron sputtering

R.L. Zong,S.P. Wen,F. Zeng,Y. Gao,F. Pan
DOI: https://doi.org/10.1016/j.jallcom.2007.10.033
IF: 6.2
2008-01-01
Journal of Alloys and Compounds
Abstract:Cu-W alloy films were prepared by magnetron sputtering. Their microstructure, hardness, elastic modulus and plastic deformation were investigated by various technologies. The results show that Cu-W amorphous alloy films are formed in the composition range from Cu36W64 to Cu75W25, and out of this range solid solutions are formed. Both the hardness and elastic modulus of Cu-W amorphous alloy films are lower than their rule-of-mixture values. The load-displacement curves of Cu-W amorphous alloys with lower Cu content exhibit obvious serrated flow at lower strain rate. Serrations are suppressed at higher strain rate and higher Cu content. For all Cu-W amorphous alloy films, shear bands are observed and their number and density increase with increasing Cu content. indicating that the details of the plastic deformation of Cu-W amorphous alloys arc material-related. (C) 2007 Elsevier B.V. All rights reserved.
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