The Key Technology and Research Status of Mask Projection Stereolithography

王伊卿,贾志洋,赵万华,卢秉恒
DOI: https://doi.org/10.13952/j.cnki.jofmdr.2009.02.014
2009-01-01
Abstract:This article introduced the key technology,applications research status of Mask projection Stereolithography(MPS) comprehensive,point out its advantages disadvantages;especially emphasized the(MPS) system composition and mask generation methods developed nowadays in MPS techniques.The failure reasons of LCD as a rapid prototyping device to generate mask is analyzad,and their device precision and reliability as well as the applicability of rapid prototyping mask generation device is compared.Then the principle of the warpage distortion in the process of MPS curing and the way to eliminate these defects are discussed.Finally,on the above analysis,the future trends of MPS is presented.
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