Abstract:Large-size diffraction gratings are essential for pulse compressors in chirped-pulse-amplified high-power laser systems, spectroscopic telescopes, etc. Fabricating large gratings requires large-aperture laser beams with collimated and aberration-free wavefronts. As an alternative a method of making monolithic gratings by optical mosaic has been proposed, which makes multiple-exposures in different areas of a substrate to enlarge the grating size. Between exposures the position and attitude of substrate must be adjusted to minimize the overall wavefront errors, with very tight accuracy requirements (similar to dozens of nanometers and tenths of micro-radians, respectively).We fully utilize the latent fringes (exposed but undeveloped fringes in photoresist) as the core reference object and the exposure beams as the adjustment beams to adjust and lock the position and attitude between consecutive exposures. This approach greatly simplifies the alignment system and eliminates many system errors. However, the diffraction efficiency of a latent grating is extremely weak (similar to 10(-5)) and excessive exposure of the latent fringes during the position and attitude adjustment should be avoided. We overcome these difficulties by carefully blocking stray lights and using a high-sensitivity CCD to monitor the interference fringes of the -1st- and 0th-order latent-fringe diffracted wavefronts. Experimentally we have made 2 x 2 mosaics of (60+28) x (53+30) mm(2) grating area. Typical peak-valley and root-mean-square values of the measured -1st-order diffraction wavefront errors are 0.06 lambda and 0.01 lambda, respectively.The mosaic conditions, detailed alignment steps, and experimental results showing position and attitude controllability will be presented. Important issues of extending the present work to large-size (possibly sub-meter) fabrication will also be discussed.

Precision Analysis of Grating Replicated Mosaic Error Based on the Principle of Fraunhofer

Design of Large-Deflection-angle High-Diffraction-efficiency High-Dispersion Hybrid Gratings

Error Analysis of Sub-Aperture Synthesis for Detecting Surface Defects of Optical Components

Method to Mosaic Gratings That Relies on Analysis of Far-Field Intensity Patterns in Two Wavelengths

Analysis and Removal of Five-Dimensional Mosaicking Errors in Mosaic Grating

Analysis of a Lloyd's Mirror Interferometer for Fabrication of Gratings

Removal of All Mosaic Grating Errors in a Single-Interferometer System by a Phase-Difference Reference Window.

Influences of Misalignment Errors of Optical Components in an Orthogonal Two-Axis Lloyd's Mirror Interferometer.

Common-path and compact wavefront diagnosis system based on cross grating lateral shearing interferometer.

Fabrication of Optical Mosaic Gratings by Consecutive Holographic Exposures Employing A Latent-Fringe Based Alignment Technique

Fabrication Of Optical Mosaic Gratings With Phase And Attitude Adjustments Employing Latent Fringes And A Red-Wavelength Dual-Beam Interferometer

Positional Detection in Grating Mosaic Based on Image Processing of Far-Field Diffraction Intensity Patterns in Two Wavelengths

Error Analysis of Gratings in Optical Pickup Heads

Method of Making Mosaic Gratings by Using a Two-Color Heterodyne Interferometer Containing a Reference Grating.

Simulation Method for Analyzing Mechanical Long-Period Fiber Gratings under High Birefringence

A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings

A mechanical mosaic method for reflective grating base on diffracted beams orientation

Fabrication of Optical Mosaic Gratings: a Self-Referencing Alignment Method

Diffraction of transmission light through triangular apertures in array of retro-reflective micro-prisms

A Mechanical Mosaic Method for Two-Dimensional Planar Grating Based on Diffracted Beams Orientation

Optical Mosaic Gratings Made by Consecutive, Phase-Interlocked, Holographic Exposures Using Diffraction from Latent Fringes